2017
DOI: 10.1016/j.ijleo.2017.06.037
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Temperature dependent electrical characterization of RF sputtered MoS2/n-Si heterojunction

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Cited by 17 publications
(2 citation statements)
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“…The films are annealed or combined with other materials, such as silicon carbide crystals, thereby effectively improving their electrical properties [12][13][14][15]. The films have a direct band gap of 1.93 eV and an indirect band gap of 1.2 eV [16,17], and they are a promising photocatalyst [18]. Therefore, studying the structure and performance of MoS 2 films is or great practical significance.…”
Section: Introductionmentioning
confidence: 99%
“…The films are annealed or combined with other materials, such as silicon carbide crystals, thereby effectively improving their electrical properties [12][13][14][15]. The films have a direct band gap of 1.93 eV and an indirect band gap of 1.2 eV [16,17], and they are a promising photocatalyst [18]. Therefore, studying the structure and performance of MoS 2 films is or great practical significance.…”
Section: Introductionmentioning
confidence: 99%
“…The results are generally in agreement with those obtained in previous The main reason for the difference in the calculated values is that the Norde functions are applied to the entire forwardvoltage region. It may also be due to the free carrier concentration caused by carriers at the interface between Pt/TiO2 nanotubes [37]- [39]. and Φb values at 100 mW/cm 2 illumination were calculated as 2.04 and 0.89 eV by using the I-V characteristic with TE method.…”
Section: (A) (B) (C)mentioning
confidence: 99%