Temperature-dependent leakage current characteristics of Pr and Mn cosubstituted BiFeO3 thin films

Abstract

Leakage current characteristics of (Bi0.86Pr0.14)(Fe0.95Mn0.05)O3 (BPFMO) thin films are studied at various temperatures from 293 down to 93 K. Space charge limited current and Poole–Frenkel (PF) emission are found to be the dominant mechanism in the low and the high electric fields, respectively. The trap ionization energy at zero-field in BPFMO films is deduced to be around 0.29 eV, which indicates the existence of shallow traps. A negative differential resistivity behavior is observed before the onset of PF emission at 93 K, which is discussed in terms of the competition between electron trapping and field-assisted thermal emission.

Enhanced polarization and dielectricity in BaTiO3:NiO nanocomposite films modulated by the microstructure

“…On the other hand, the J-E curves of the nanocolumnar lms of C-1 and the nanogranular lms can be tted well by the modied Langmuir-Child law: 67,68 J f aE + bE 2 (2)…”

Structure, ferroelectric/magnetoelectric properties and leakage current density of (Bi0.85Nd0.15)FeO3 thin films

“…However, one of the major drawbacks related to BiFeO 3 is its high leakage current density. Therefore, it allows current to pass through when a high voltage is applied [22][23][24]. Currently, great efforts have been made to improve electrical properties by doping with rare-earth elements such as: lanthanum [25][26][27][28][29], praseodymium [30,31], samarium [32][33][34][35], europium [36][37][38][39], gadolinium [40,41], dysprosium [42,43] and neodymium (Nd) [44][45][46][47][48].…”

Effects of γ-ray irradiation on ferroelectric properties of Pr and Mn co-substituted BiFeO3 thin films

“…BPFMO thin films were prepared on Pt/TiO 2 /SiO 2 /Si substrates by chemical solution deposition using spin-coating, as reported previously. 17 Each layer of the BPFMO was baked at 300 0 C, pyrolyzed at 400 0 C for 10 min in O 2 , and then annealed at 525 0 C for 3 min in N 2 . The spin-coating and heat treatment steps were repeated for several times to obtain the desired film thickness.…”