Temperature-dependent orientation of self-organized nanopatterns on ion-irradiated TiO<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:msub><mml:mrow /><mml:mn>2</mml:mn></mml:msub></mml:math>(110)

Kolmer, Marek; Zebari, Amir A. Ahmad; Goryl, M.; Mongeot, F. Buatier de; Zasada, Filip; Piskorz, Witold; Pietrzyk, Piotr; Sojka, Zbigniew; Szymoński, Marek

doi:10.1103/physrevb.88.195427

Cited by 18 publications

(16 citation statements)

References 39 publications

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“…revealed that those diffusion rates behave differently at room and elevated temperature. 43 Into-bulk diffusion, which compensates a titanium enrichment of the subsurface layer (because of the preferential O sputtering), is activated at 620 K, providing a significant difference in stoichiometry between room temperature and 740 K irradiated samples. We further assume that the local roughness of both substrates, room temperature and 740 K, is comparable.…”

Section: Resultsmentioning

confidence: 99%

“…In-plane diffusion recovery of the surface smoothness (local crystallographic order) after sputtering is already activated at lower temperatures. 43 Therefore, we expect that in the case of TiO 2 (110) the surface chemistry/ stoichiometry is a decisive factor for the resulting film morphology. However, because in both cases, 740 K and room temperature, the upright molecular configuration is already dominating at small ion fluences, it seems that slight disturbance is sufficient to switch the growth from flat-lying molecular orientation (needles) to upright orientation (islands).…”

Section: Resultsmentioning

confidence: 99%

“…At this temperature, the excess Ti atoms diffuse into the bulk, recovering surface stoichiometry. 43 …”

Section: Methodsmentioning

confidence: 97%

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Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO₂(110) Surfaces

et al. 2015

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We report on para-hexaphenyl (6P) ultrathin film growth on freshly prepared and air-passivated atomically flat rutile titanium dioxide single-crystal (110) surfaces. The surface morphology of the developed structures has been investigated in situ and ex situ by means of various scanning probe techniques and electron microscopy. In situ 6P deposition results in the formation of a wetting layer of lying molecules coexisting with bunches of tens of micrometers long needles oriented along the TiO 2 [11̅ 0] surface direction. The observed bunching of the 3−5 nm high needles is explained in terms of anisotropic diffusion paths along and perpendicular to the needles. Air exposure of the asprepared films induces the formation of small features at the cost of the 6P wetting layer, whereas the needles stay unchanged. In contrast, 6P deposition on already air-passivated TiO 2 (110) yields the formation of dendritic islands, composed of roughly upright-standing molecules. No 6P wetting layer forms on the air-passivated surface. In addition to air exposure, we have checked the impact of surface modification via ion beam bombardment. Growth of 6P on gradient ion-beam-modified titanium dioxide substrates kept at either room or elevated temperature reveals that a slight surface roughening is sufficient to switch the film from lying molecular orientation to upright-standing orientation. However, surface stoichiometry severely influences film properties like size, density, and shape of the 6P islands.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

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Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO₂(110) Surfaces

et al. 2015

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“…In this paper we aim at developing such framework by studying how substrate features may affect the film nanostructure when using the MS‐OAD technique. In particular, we focus on the effect of one dimensional quasi‐periodic patterned substrates, characterized by peak‐to‐peak distances in the order of few hundred nanometers, very similar to those experimentally obtained by ion beam sputtering . To address this problem, we have first used a well‐accepted model to theoretically simulate and analyze the growth of a thin film on purely periodic and near periodic patterned substrates at oblique angles and, subsequently, experimentally test these results by analyzing the growth of porous SiO 2 thin films on quasi‐periodic ion‐induced patterned Si substrates.…”

Section: Introductionmentioning

confidence: 98%

Growth of nanocolumnar thin films on patterned substrates at oblique angles

García-Valenzuela

Muñoz‐Piña

Alcalá

et al. 2018

Plasma Processes & Polymers

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The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well-established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO 2 thin films on ioninduced patterned substrates. K E Y W O R D S magnetron sputtering, nanostructures, oblique angle deposition, patterned substrate, thin films Plasma Process Polym. 2019;16:e1800135.www.plasma-polymers.com

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“…Thus, the advance in the understanding of IBS nanopatterning of Si surfaces can indeed improve the control of this process not only in this material but also in many others, which surely will contribute to develop new and interesting applications for this kind of patterns at the nanoscale. Finally, it should be noted that although this review is focused on nanopatterning of silicon surfaces, recent efforts have been devoted to exploring new applications of IBS nanopatterns by extending the process to other highly functional semiconductors such as TiO 2 [293,294], ZnO [295] or CdTe [296].…”

Section: Applicationsmentioning

confidence: 99%

Self-organized nanopatterning of silicon surfaces by ion beam sputtering

Muñoz-García

Vázquez

Castro

et al. 2014

Materials Science and Engineering: R: Reports

166

201

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Temperature-dependent orientation of self-organized nanopatterns on ion-irradiated TiO2(110)

Cited by 18 publications

References 39 publications

Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO₂(110) Surfaces

Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO₂(110) Surfaces

Growth of nanocolumnar thin films on patterned substrates at oblique angles

Self-organized nanopatterning of silicon surfaces by ion beam sputtering

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Temperature-dependent orientation of self-organized nanopatterns on ion-irradiated TiO2(110)

Cited by 18 publications

References 39 publications

Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces

Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces

Growth of nanocolumnar thin films on patterned substrates at oblique angles

Self-organized nanopatterning of silicon surfaces by ion beam sputtering

Contact Info

Product

Resources

About

Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO₂(110) Surfaces

Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO₂(110) Surfaces