2014
DOI: 10.1038/srep06131
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Temperature-dependent photoluminescence in light-emitting diodes

Abstract: Temperature-dependent photoluminescence (TDPL), one of the most effective and powerful optical characterisation methods, is widely used to investigate carrier transport and localized states in semiconductor materials. Resonant excitation and non-resonant excitation are the two primary methods of researching this issue. In this study, the application ranges of the different excitation modes are confirmed by analysing the TDPL characteristics of GaN-based light-emitting diodes. For resonant excitation, the carri… Show more

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Cited by 142 publications
(80 citation statements)
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“…As the temperature increases, the PL intensity decreases with a simultaneous blue shift of the emission peak. [32] Figure 3a shows the Arrhenius plot of integrated PL intensity versus inverse temperature, fitted using the Arrhenius equation as below [33,34] [29] The room-temperature forward PL yield (η PL_forward ) [30] of the CsPbBr 3 NC film ≈31% at the excitation energy ≈3.7 µJ cm −2 .…”
Section: Resultsmentioning
confidence: 99%
“…As the temperature increases, the PL intensity decreases with a simultaneous blue shift of the emission peak. [32] Figure 3a shows the Arrhenius plot of integrated PL intensity versus inverse temperature, fitted using the Arrhenius equation as below [33,34] [29] The room-temperature forward PL yield (η PL_forward ) [30] of the CsPbBr 3 NC film ≈31% at the excitation energy ≈3.7 µJ cm −2 .…”
Section: Resultsmentioning
confidence: 99%
“…On the contrary, the carriers associated with higher activation energy will gain sufficient energy at higher temperatures, the temperature change affects this emission much more. Thus the non‐radiative relaxation process with a small activation energy of E1, E3, E4 results in a decrease in the PL intensity . Therefore, as the temperature is increased, the carriers with lower activation energy will start to escape into the barrier where they can recombine non‐radiatively leading to decrease in the PL intensity, while carriers with higher activation energy lead to NTQ behavior.…”
Section: Table Summarizing Activation Energies For Negative Thermal Qmentioning
confidence: 99%
“…Likewise, more carriers generated in GaN barrier layers are trapped by localized states, impurities, or defects or rapidly recombine. However, the excitation rate in GaN barrier layer is much lower than the localized emission in InGaN quantum well and thus the contribution of GaN barrier layer to the emission of InGaN quantum‐well layer could be ignored, which has been proved in our previous work . Figure a shows the PL spectrum of MQWs nanopillar structure under no force at an excitation power of 45 mW.…”
Section: Resultsmentioning
confidence: 74%