The current transport properties and resistance-switching (RS) behavior at platinum/niobium-doped strontium-titanate (Pt/NSTO) Schottky junctions were investigated for junctions with different degrees of oxidation (PtO x ) in the Schottky electrode. It was found that the rectifying current-voltage (I-V) profile strongly depends on the heat-treatment of the NSTO crystal and oxidation of the Pt electrode. The hysteresis in the I-V relationships was larger for the PtO x /NSTO junction than for the pure Pt/NSTO junction, and heat-treatment of the NSTO crystal suppresses the hysteresis in I-V and increases the leakage current. The change in the rectifying I-V profiles can be reasonably explained by the increase in the built-in potential caused by partial oxidation of the electrode interface, as determined by soft X-ray photoemission spectroscopy. The experimental results indicate that control of the built-in potential and the partial oxidation of the electrode, which affects the homogeneity of the potential profile, is the key to improving and controlling the rectification and RS properties in Pt/NSTO junctions.Colossal electroresistance (CER) phenomena, i.e., the immense changes in electric resistance induced by applying electric fields, 1 have been observed in many metal/insulator/metal (MIM) structures including titanium oxide sandwiched by metal electrodes 2 and metal/semiconductor (MS) Schottky junction structures such as niobium-doped strontium titanate (NSTO) with a platinum (Pt) electrode. 3 One typical consequence of the CER effect is the so-called resistance-switching (RS) behavior, which is defined as a reversible change in the electronic resistance between the high-resistance state (HRS) and low-resistance state (LRS) upon application of an electric field such as a pulsed bias. What is unique about the RS behavior is that the HRS and LRS remain even after removal of the electric bias applied for switching. For this reason, RS behavior is of interest for the development of nonvolatile random access memory (NVRAM) cells. 2,4 Although the RS behavior of metal/NSTO junctions is interesting in terms of both physics and electronics, several technical problems remain. The most significant problem is poor reproducibility of the properties of metal/NSTO junctions. In particular, the appearance of RS behavior strongly depends on the sample preparation procedures. 5 Obvious hysteresis in the current-voltage (I-V) curves (RS behavior) of metal/NSTO junctions have been reported in some papers, 3,6 but, in contrast, no trace of RS behavior was found at the metal/NSTO junctions reported in other papers. 7,8 Another problem is that the RS speed and resistance retention properties are poor compared with those of conductive-filament-type RS devices. 9,10 In particular, a long pulse voltage is needed to obtain a large resistance change, and the resistance state cannot be memorized for long in metal/NSTO junctions. Therefore, for practical application of RS devices, we need to clarify the material and process parameters gover...