Temperature-Dependent Thermal Conductivity and Absorption Coefficient Identification of Quartz Window up to 1100 K

Shi, Yu; Chen, Xue; Sun, Chuang; Xia, Xin‐Lin

doi:10.1007/s11630-022-1747-x

Cited by 8 publications

(1 citation statement)

References 46 publications

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“…At the same temperature, silicon exhibits significantly higher thermal conductivity compared to quartz glass. 29,30) This difference is primarily attributed to the lower thermal deformation of the silicon substrate and its superior heat dissipation capability, which play a significant role in facilitating the formation of more uniform nanostructures. The presence of island-like structures resulted in areas without tungsten in certain regions, whereas the tungsten film irradiation on silicon substrates yielded consistent corrugated nanostructures.…”

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confidence: 99%

Formation of corrugated nano-fuzz tungsten thin film on silicon via helium plasma irradiation

Feng,

Kajita,

Yasuhara

et al. 2023

Jpn. J. Appl. Phys.

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Tungsten thin films were deposited onto silicon substrates using sputtering techniques, and helium plasma irradiation was performed in a linear plasma device. Observations of the surface and cross-sectional morphology revealed the presence of a corrugated fiberform nanostructure, referred to as corrugated nano-fuzz, on the irradiated silicon samples. This structure has a distinct pattern of ridges and valleys with nanofibers on the surface. In addition to its unique morphology, the corrugated nano-fuzz demonstrates remarkable optical absorptivity, as revealed by optical absorptivity measurements, even after being exposed to helium plasma even for a short duration. The utilization of silicon-substrate thin film holds the potential to not only accelerate the processing for nanostructure growth but also yield uniformly corrugated structures and high optical absorptivity. These findings offer valuable insights for advancing the development of efficient fabrication methods within the field of nanotechnology.

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confidence: 99%