2007 9th European Conference on Radiation and Its Effects on Components and Systems 2007
DOI: 10.1109/radecs.2007.5205575
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Temperature effect on the heavy-ion induced Single-Event Transients propagation on a CMOS Bulk 0.18 µm inverters chain

Abstract: The ATLAS simulation tool from SILVACO is used for 3D simulations. This software solves the transient semiconductor device equations in three dimensions, including the Poisson equation and the current continuity equations. The technology modeled in this work is a CMOS Bulk 0.18 urn process manufactured by ATMEL and transistors are designed for 1.8 V operation bias. The 3D inverter is modeled on a p-type silicon substrate. The doping profiles have been obtained by process simulation with ATHENA in order to obta… Show more

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Cited by 1 publication
(2 citation statements)
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“…A total charge decreasing strongly with temperature was not observed by Guo et al, although the substrate doping of around cm [10] used there is probably quite different to that used here (judging by the relative collection lengths). The qualitative trend observed in our data also disagrees with that of Truyen et al [11] and does in fact suggest a marked drop in minority carrier diffusion length at higher temperatures, which did actually occur in the Guo et al data, but to a much reduced extent.…”
Section: Discussioncontrasting
confidence: 74%
See 1 more Smart Citation
“…A total charge decreasing strongly with temperature was not observed by Guo et al, although the substrate doping of around cm [10] used there is probably quite different to that used here (judging by the relative collection lengths). The qualitative trend observed in our data also disagrees with that of Truyen et al [11] and does in fact suggest a marked drop in minority carrier diffusion length at higher temperatures, which did actually occur in the Guo et al data, but to a much reduced extent.…”
Section: Discussioncontrasting
confidence: 74%
“…That being the case, it stands to reason that increased pulse widths at higher temperatures can be expected to result in a higher DSET propagation cross-section. Truyen et al have in fact simulated DSET generation and propagation in the ATMEL 180 nm process from approximately 200 K to 400 K using 3D TCAD simulation [11]. In that work, DSET cross-sections did indeed increase several fold at higher temperatures.…”
Section: Introductionmentioning
confidence: 92%