Temperature effects on radiation induced phenomena in polytetrafluoroetylene (PTFE)—Change of G-value

Oshima, Akira; Ikeda, Shigetoshi; Kudoh, Hisaaki; Seguchi, Tadao; Τabata, Yoneho

doi:10.1016/s0969-806x(97)00103-5

Cited by 71 publications

(36 citation statements)

References 12 publications

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“…G(s) is calculated to be 4.44 (n/100 eV), corresponding to 0.46 Â 10 À6 mol/J. This is consistent with the reported value for PTFE irradiated in ambient atmosphere [18].…”

Section: Dsc Measurement and G-value Of Scissionsupporting

confidence: 90%

Study on polytetrafluoroethylene aqueous dispersion irradiated by gamma ray

Wang

Liu

et al. 2006

Journal of Fluorine Chemistry

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“…G(s) is calculated to be 4.44 (n/100 eV), corresponding to 0.46 Â 10 À6 mol/J. This is consistent with the reported value for PTFE irradiated in ambient atmosphere [18].…”

Section: Dsc Measurement and G-value Of Scissionsupporting

confidence: 90%

Study on polytetrafluoroethylene aqueous dispersion irradiated by gamma ray

Wang

Liu

et al. 2006

Journal of Fluorine Chemistry

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“…We note that results published recently by Oshima et al 5,[7][8][9][10] and Tabata et al 6 indicate branching and crosslinking of PTFE by irradiation under similar conditions. Of course, the possibility that branches with side chains longer than the CF 3 group or crosslinked structures are formed by irradiation of molten PTFE cannot be ruled out.…”

Section: Discussionsupporting

confidence: 80%

Electron beam irradiation of polytetrafluoroethylene in vacuum at elevated temperature: An infrared spectroscopic study

Lappan

Geißler

Lunkwitz

1999

J. Appl. Polym. Sci.

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Electron beam irradiation of polytetrafluoroethylene (PTFE) has been performed in vacuum both at elevated temperature above the melting point of PTFE and at room temperature for comparison. The changes in the chemical structure were studied by Fourier-transform infrared (FTIR) spectroscopy. The formation of double bonds in PTFE was confirmed as a result of irradiation in vacuum. Moreover, trifluoromethyl (CF 3 ) branches were detected. The concentration of CF 3 branches was found to be much higher in irradiation at elevated temperature than in room temperature irradiation. The CF 3 branches are assumed to cause the reduced crystallinity indicated by the transparency of PTFE specimens irradiated in the molten state.

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“…RX-PTFE has excellent characteristics, such as low adhesive property, radiation durability and so on [6][7][8][9]. Therefore, the RX-PTFE can be used as the mold for not only UV-NIL but also EB-NIL.…”

Section: Introductionmentioning

confidence: 99%

Improvement of the Durability of Crosslinked PTFE Molds for UV- /EB-Nanoimprint Lithography

Takahashi

Kobayashi

Okubo

et al. 2012

J. Photopol. Sci. Technol.

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It has been reported that the nano-/micro-fabricated crosslinked polytetrafluoroethylene (RX-PTFE) by focused ion beam (FIB) direct etching technique could be used as the polymeric molds for the ultraviolet nanoimprint lithography (UV-NIL) and electron beam NIL (EB-NIL). In this study, to evaluate the durability of RX-PTFE molds for repeating printing cycles, the RX-PTFE was spin-coated on two kinds of substrates; none-metal treated silicon wafer and 50 nm thick Al-layer deposited one. Then, RX-PTFE molds were obtained by FIB irradiation. 450 × 450 nm and 950 × 950 nm squares and 1000 nm circle were fabricated in 40 × 40 µm areas. Intervals of the squares and circle were 450 nm, 950 nm and 1000 nm, respectively. In the case of none-treated substrate, the 3 rd imprinted pattern was distorted. On the other hand, the 10 th imprinted patterns with UV-NIL were successfully obtained with the Al-layer deposited substrate. Though it is concerned about the mechanical strength of RX-PTFE degrading due to EB irradiation, EB-NIL was similarly succeeded with Al-layer deposited substrate. It is considered that the mold durability for printing would be improved due to high adhesion between Al-layer and RX-PTFE, because the fluorination of Al was caused by crosslinking treatment at high temperatures. Thus, it is suggested that the durability of RX-PTFE mold with Al-layer deposited substrate would be retained after 10 times UV-/EB-NIL processes.

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Temperature effects on radiation induced phenomena in polytetrafluoroetylene (PTFE)—Change of G-value

Cited by 71 publications

References 12 publications

Study on polytetrafluoroethylene aqueous dispersion irradiated by gamma ray

Study on polytetrafluoroethylene aqueous dispersion irradiated by gamma ray

Electron beam irradiation of polytetrafluoroethylene in vacuum at elevated temperature: An infrared spectroscopic study

Improvement of the Durability of Crosslinked PTFE Molds for UV- /EB-Nanoimprint Lithography

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