In this article, the authors discuss the growth nature, the structural, optical and dielectric properties of CuSe thin films deposited onto MoO 3 substrate. The films are studied by the X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy and ultraviolet-visible light spectroscopy techniques. CuSe thin films are observed to exhibit strained nature of growth when grown onto MoO 3 amorphous substrates. Optically, the MoO 3 /CuSe films are found to exhibit conduction (ΔE c ) and valence (ΔE v ) band offsets of values of 3.70 and 3.42 eV, respectively. In addition, a remarkable increase in the absorbability (R λ ) of MoO 3 by 72 times at 3.0 eV is obtained as a result of coating it with CuSe. The ΔE c , ΔE v , and R λ values are significantly high and nominate the MoO 3 /CuSe interfaces for use in many optoelectronic applications. In addition, the dielectric analysis shows that the MoO 3 /CuSe heterojunction exhibit optical conductivity parameters that make it suitable for use in optical communications. Particularly, the Drude-Lorentz modeling of the imaginary part of the dielectric constant for the MoO 3 /CuSe interfaces displays mobility and plasmon frequency values of 7.76 cm 2 V À1 s À1 and 3.78 GHz, respectively. The obtained plasmon frequency values indicate the applicability of this device in microwave technology.