Temperature evolution during scanning electron beam processing of silicon

Local modification of magnetic properties by an electron beam

“…Highly intense electron beams are routinely used to anneal materials. 17 However, beam powers similar to those used in the present study are expected to lead to a temperature increase of the order of only 0.03 K. 13,18 Thus the anisotropy change is not induced by thermal annealing. Similarly we can also rule out interface alloying as a possible mechanism.…”