2021
DOI: 10.1109/tpel.2021.3049394
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Temperature-Independent Gate-Oxide Degradation Monitoring of SiC MOSFETs Based on Junction Capacitances

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Cited by 42 publications
(7 citation statements)
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“…Note that consists of the overlap capacitance of the gate electrode with source plus channel region and the parallel capacitance across the gate and source metallization ( ) [ 20 ]; in the active area of a 650 SiC MOSFET is addressed as where is the total length of the overlap between gate and source and the channel region and is the inter-layer dielectric capacitance, which stays constant for all the devices due to the same fabrication process being used for wafers 1 and 2.…”
Section: Device Characteristics and Discussionmentioning
confidence: 99%
“…Note that consists of the overlap capacitance of the gate electrode with source plus channel region and the parallel capacitance across the gate and source metallization ( ) [ 20 ]; in the active area of a 650 SiC MOSFET is addressed as where is the total length of the overlap between gate and source and the channel region and is the inter-layer dielectric capacitance, which stays constant for all the devices due to the same fabrication process being used for wafers 1 and 2.…”
Section: Device Characteristics and Discussionmentioning
confidence: 99%
“…The kelvin-source impedance is presented for package degradation monitoring which is only applicable for 4pin devices with the Kelvin connection [74]. The device's thermal impedance [75], saturation current [76], and miller capacitance [77] are other parameters for aging monitoring. These precursors can hardly be used for online tracking.…”
Section: Precursor Selection For Condition Monitoringmentioning
confidence: 99%
“…However, the package degradation at lower currents does not affect the body diode voltage. The body diode voltage at lower current is highly On-Resistance, (Rds,ON ) [82]- [84] Threshold Voltage, (Vth) [77], [83], [85] 2.4 mΩ/ • C for vendor A 1.6 mΩ/ • C for vendor B -6.4 mV/ • C for vendor A -3.1 mV/ • C for vendor B -Needs synchronized measurement for drain-source voltage and drain current.…”
Section: Junction Temperature Measurementmentioning
confidence: 99%
“…During each switching commutation, these dielectric materials are subjected to high electric fields stresses causing conducted leakage current through the insulation material due to the capacitive couplings, over time this can degrade the insulation properties of the dielectric materials [92]. In [93] a correlation between gate oxide degradation and the MOSFET intrinsic capacitive couplings are reported, where it is proposed to use the MOSFET change in capacitance as a precursor to the gate oxide degradation, however the mechanisms behind the proposed correlation are unclear. Another phenomenon related to the insulation degradation in PEC systems is the partial discharge phenomenon, which in various studies have been documented to cause long term degradation of dielectric material insulation properties [94]- [96].…”
Section: Reliability and Thermal Stressesmentioning
confidence: 99%