Temperature rise in a birefringent substrate caused by RF discharge plasma

Takaki, Koichi; Sayama, Kunio; Takahashi, Atsushi; Fujiwara, Tamiya; Nagata, M.; Ono, M.; Jani, Muaffaq Achmad

doi:10.1002/(sici)1520-6416(199906)127:4<9::aid-eej2>3.0.co;2-5

Cited by 4 publications

(2 citation statements)

References 9 publications

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“…In this case measurements using non-contacting methods to overcome the problems that exist during the measurement. The measurement results are usually obtained on average, while the necessary data at each point of material can't be measured [4,6]. By using a method of numerical analysis method [8] based on observations of thermal expansion, will be able to estimate the temperature distribution at all points at a certain thickness.…”

Section: Introductionmentioning

confidence: 99%

Numerical Analysis of Material Temperature Distribution

Jani¹

2014

AMR

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The temperature of the surface of a material in a manufacturing process of plasma is very important information, while the results of measurements usually indicate the average temperature of the material. By using the method of numerical analysis, the distribution of temperature on the thickness of the material can be formulated using the heat conduction equation for material. Heat distribution that occurs is computed using a heat flux parameter input power, the heat transfer coefficient and surface area of the material. Simulations performed on the heat distribution PMMA and LiNbO3 crystal with thickness of 2 to 2.5 mm.

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Section: Introductionmentioning

confidence: 99%

Numerical Analysis of Material Temperature Distribution

Jani¹

2014

AMR

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“…The retardation of 2 corresponds to a temperature change of 1.47°C for the 1 cm length of the LiNbO 3 substrate tip. 16 By counting the number of fringes as a function of time, the data can be easily plotted as substrate temperature versus time. 17 The experiments were repeated for various radial LiNbO 3 tip positions.…”

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confidence: 99%

Heat flux distribution on a substrate in capacitively coupled radio-frequency discharges

Takaki

Koseki

Fujiwara

2002

Applied Physics Letters

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This letter investigates the heat flux distribution on a substrate in capacitively coupled radio-frequency argon glow discharges. The heat fluxes were determined from substrate temperature distributions measured by a high-sensitivity laser interferometer method with a LiNbO3 birefringent substrate. This method is based on monitoring the variation of refractive index with temperature. The distribution was obtained by sliding the 1-cm long LiNbO3 substrate between two semicircular glass substrates placed on a disk electrode, 12 cm in diameter. The gap length was fixed at 2 cm and gas pressure was 100 mTorr. For the substrate placed on the powered electrode, the heat flux increases radically from the glow center to the radial electrode edge from 40 to 58 mW/cm2. The heat flux toward the grounded electrode increases radically from 15 to 21 mW/cm2. The total measured heat flux to the electrode is in good agreement with electrical power consumption determined from voltage and current measurements. The radial electron density profile in the discharge chamber was measured using a Langmuir probe. The results show that the maximum electron density observed at the electrode edge coincides with the maximum heat flux.

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Material Temperature Measurement Using Non-contacting Method

Jani

2015

Springer Proceedings in Physics

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Temperature rise in a birefringent substrate caused by RF discharge plasma

Cited by 4 publications

References 9 publications

Numerical Analysis of Material Temperature Distribution

Numerical Analysis of Material Temperature Distribution

Heat flux distribution on a substrate in capacitively coupled radio-frequency discharges

Material Temperature Measurement Using Non-contacting Method

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