2009
DOI: 10.1149/1.3156639
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Template Epitaxial Growth of Thermoelectric Bi/BiSb Superlattice Nanowires by Charge-Controlled Pulse Electrodeposition

Abstract: Bi/BiSb superlattice nanowires ͑SLNWs͒ with a controllable and very small bilayer thickness and a sharp segment interface were grown by adopting a charge-controlled pulse electrodeposition. The deposition parameters were optimized to ensure an epitaxial growth of the SLNWs with a preferential orientation. The segment length and bilayer thickness of the SLNWs can be controlled simply by changing the modulating time, and the consistency of the segment length can be well maintained by our approach. The Bravais la… Show more

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Cited by 19 publications
(12 citation statements)
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References 45 publications
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“…Figure 1d shows the HRTEM image of the region marked with a white rectangle in Fig. 1c , the clear and continue lattice fringes proved that the nanowire axis is along [110] direction, but no vacancies or dislocations were observed, as consistent with our previous observation [ 32 , 33 ].…”
Section: Resultssupporting
confidence: 88%
See 1 more Smart Citation
“…Figure 1d shows the HRTEM image of the region marked with a white rectangle in Fig. 1c , the clear and continue lattice fringes proved that the nanowire axis is along [110] direction, but no vacancies or dislocations were observed, as consistent with our previous observation [ 32 , 33 ].…”
Section: Resultssupporting
confidence: 88%
“…We adopt the charge-controlled pulse electrodeposition to fabricate Bi/Bi 0.5 Sb 0.5 SLNWs in a two-electrode plating cell in which the AAM sputtered with a layer of Au film (about 200 nm in thickness) serves as the cathode, and a graphite plate serves as the counter electrode [ 32 , 33 ]. The AAM with the pore size of about 60 nm was prepared using the same procedures as in our previous reports [ 20 - 23 , 25 , 32 - 34 ].…”
Section: Methodsmentioning
confidence: 99%
“…Weber et al (2008) electrodeposited high density nanowire arrays in AAO templates from the electrolyte of 50 mM Bi 3+ + 50 mM Sb 3+ in dimethyl sulfoxide. Dou et al (2009) synthesized Bi/BiSb multilayer nanowires by pulsed electrodeposition with small bilayer thickness. The electrolyte for the deposition contained a mixture of 80 mM SbCl 3 , 40 mM BiCl 3 , 0.24 M citric acid, 0.27 M tartaric acid, 1.2 M NaCl, 0.1 M glycerol and 1.0 M HCl.…”
Section: Electrodeposition Of Bismuth Telluride (Bi 2 Te 3 ) Based Materials Including Bite Bisbte Bitese and Bisbtesementioning
confidence: 99%
“…We adopt the charge-controlled pulse electrodeposition to fabricate Bi/Bi 0.5 Sb 0.5 superlattice nanowires in a two-electrode plating cell [37,38]. Briefly, the lower and higher pulse potentials are set by a computer-controlled pulse potential signal generator, the computer instantaneously integrates the current that the Real Time Current Acquisition System acquired to get the electric charge that passes during each time interval and subsequently monitors the pulse potential signal generator.…”
Section: Bi-bisb Superlatticesmentioning
confidence: 99%