Temporal and spatial distribution profiles of lithium atoms in low-pressure discharges by concentration-modulated absorption spectroscopy

Allott, Richard M.; Kubinyl, Miklos; Grofcsik, A.; Jones, W. Jeremy; Mason, Rod S.

doi:10.1039/ft9959101297

Cited by 8 publications

(3 citation statements)

References 13 publications

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“…Experimental studies on HCDs are based on atomic emission, 5,6,12 absorption, [13][14][15] fluorescence, 16 and mass spectrometry. 17 Theoretical works are mainly based on numerical simulations.…”

Section: Introductionmentioning

confidence: 99%

Study of the sputtered Cu atoms and Cu+ ions in a hollow cathode glow discharge using a hybrid model

Baguer

Bogaerts

2005

Journal of Applied Physics

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Role of the fast Ar atoms, Ar + ions, and metastable Ar atoms in a hollow cathode glow discharge: Study by a hybrid modelThe role of the Cu atoms sputtered from the cathode material in a cylindrical hollow cathode discharge ͑HCD͒ and the corresponding Cu + ions are studied with a self-consistent model based on the principle of Monte Carlo ͑MC͒ and fluid simulations. In order to obtain a more realistic view of the discharge processes, this model is coupled with other submodels, which describe the behavior of electrons, fast Ar atoms, Ar + ions, and Ar metastable atoms, also based on the principles of MC and fluid simulations. Typical results are, among others, the thermalization profile of the Cu atoms, the fast Cu atom, the thermal Cu atom and Cu + ion fluxes and densities, and the energy distribution of the Cu + ions. It was found that the contribution of the Ar + ions to the sputtering was the most significant, followed by the fast Ar atoms. At the cathode bottom, there was no net sputtered flux but a net amount of redeposition. Throughout the discharge volume, at all the conditions investigated, the largest concentration of Cu atoms was found in the lower half of the HCD, close to the bottom. Penning ionization was found the main ionization mechanism for the Cu atoms. The ionization degree of copper atoms was found to be in the same order as for the argon atoms ͑10 −4 ͒.

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Section: Introductionmentioning

confidence: 99%

Study of the sputtered Cu atoms and Cu+ ions in a hollow cathode glow discharge using a hybrid model

Baguer

Bogaerts

2005

Journal of Applied Physics

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“…89 A disadvantage of conventional AAS experiments is the need for accurate knowledge of the absorption coefficient or calibration with known standards in order to obtain absolute density profiles. This drawback is overcome by the so-called ''concentration-modulated absorption spectrometry (COMAS)'', applied by Mason and co-workers, 90,91 where two laser beams are shone through the glow discharge. The first beam, called pump beam, is modulated.…”

Section: Atomic Absorption Spectrometrymentioning

confidence: 99%

Plasma diagnostics and numerical simulations: insight into the heart of analytical glow discharges

Bogaerts

2007

J. Anal. At. Spectrom.

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“…For the copper atoms, however, varying the boundary conditions between n Cu = 0 (sticking coefficient A 0 = 1) and ∇ n Cu = 0 (sticking coefficient A 0 = 0) yielded different results for the copper atom density. A lot of models describing the behavior of sputtered atoms use the boundary condition n M = 0 without justification. ,,, However, it has been suggested that the sticking coefficient of atoms, A 0 , is different from 1. , In ref , it is stated that A 0 may vary between 0.5 and 0.01, depending largely on the structure of the surface. We have measured three-dimensional number density profiles of sputtered tantalum atoms in a six-way cross glow discharge with laser-induced fluorescence .…”

Section: Description Of the Modelmentioning

confidence: 99%

Two-Dimensional Model of a Direct Current Glow Discharge: Description of the Argon Metastable Atoms, Sputtered Atoms, and Ions

Bogaerts

Gijbels

1996

Anal. Chem.

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A two-dimensional model is presented that describes the behavior of argon metastable atoms, copper atoms, and copper ions in an argon direct current glow discharge, in the standard cell of the VG9000 glow discharge mass spectrometer for analyzing flat samples. The model is combined with a previously developed model for the electrons, argon ions, and atoms in the same cell to obtain an overall picture of the glow discharge. The results of the present model comprise the number densities of the described plasma species, the relative contributions of different production and loss processes for the argon metastable atoms, the thermalization profile of the sputtered copper atoms, the relative importance of the different ionization mechanisms for the copper atoms, the ionization degree of copper, the copper ion-to-argon ion density ratio, and the relative roles of copper ions, argon ions, and atoms in the sputtering process. All these quantities are calculated for a range of voltages and pressures. Moreover, since the sticking coefficient of copper atoms on solid surfaces is not well-known in the literature, the influence of this parameter on the results is briefly discussed.

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Temporal and spatial distribution profiles of lithium atoms in low-pressure discharges by concentration-modulated absorption spectroscopy

Cited by 8 publications

References 13 publications

Study of the sputtered Cu atoms and Cu+ ions in a hollow cathode glow discharge using a hybrid model

Study of the sputtered Cu atoms and Cu+ ions in a hollow cathode glow discharge using a hybrid model

Plasma diagnostics and numerical simulations: insight into the heart of analytical glow discharges

Two-Dimensional Model of a Direct Current Glow Discharge: Description of the Argon Metastable Atoms, Sputtered Atoms, and Ions

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