Temporal evolution of dot patterns during ion sputtering

Self-organized nanopatterning of silicon surfaces by ion beam sputtering

“…Moreover, the fact that the peak becomes narrower with increasing time, Fig. 18(a), indicates that the domain size of ordered structures increases [104], in agreement with the improvement of the order in the autocorrelation functions displayed in the insets of Fig. 16 , they collapse into a single curve, which indicates that the final pattern characteristics are defined by the total number of ions that impinge onto the surface.…”

“…20(c). Here, the small width of the main peak and the appearance of secondary peaks are indications of the relatively large sizes of ordered dot domains [104]. The experimental set-up by Ziberi et al [99] for nanodot production differs from that depicted in Fig.…”

Nanopore sculpting with noble gas ions

“…Low energy noble gas ion beams have been applied as an effective tool to modify surface structures and properties on various materials at the nanoscale [7][8][9][12][13][14][15]. Here we present ion beam sculpting results for a variety of noble gas ions and ion beam fluxes to drastically change some of the potentially relevant parameters of the process.…”

Observation and Modeling of Interrupted Pattern Coarsening: Surface Nanostructuring by Ion Erosion

“…2(b)], although it is interrupted for long enough irradiation times, after which both and ' reach stationary values. Although coarsening has been reported experimentally in ripple formation by IBS [7,20], results remain controversial for nanodot patterns on semiconductor surfaces [21][22][23].…”