2016
DOI: 10.1016/j.infrared.2016.05.023
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Terahertz generation from electron- and neutron-irradiated semiconductor crystal surfaces

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Cited by 9 publications
(2 citation statements)
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“…Nonlinear optical (NLO) materials have an important role in lithography, semiconductor manufacturing, and laser technology. [1][2][3][4][5][6][7][8] Over the past few decades, with continuous efforts, scientists have developed many commercially available NLO materials for application in the ultraviolet to mid-infrared regions, for example BaB 2 O 4 (BBO), 9 LiB 3 O 5 (LBO), 10 KH 2 PO 4 (KDP), 11 KTiOPO 4 (KTP), 12 AgGaQ 2 (Q = S, Se), 13,14 ZnGeP 2 (ZGP), 15 LiGaS 2 , 16 LiInSe 2 , 17 and GaSe. 18 In general, the following specifications must also be satisfied for a NLO crystal with suitable performance: 19 a non-centrosymmetric space group to perform the NLO function, an enough effective NLO coefficient (d eff > 0.39 pm V −1 ), a wide band gap (E g > 6.2 eV) and an acceptable birefringence (0.05-0.1) to achieve phase matching.…”
Section: Introductionmentioning
confidence: 99%
“…Nonlinear optical (NLO) materials have an important role in lithography, semiconductor manufacturing, and laser technology. [1][2][3][4][5][6][7][8] Over the past few decades, with continuous efforts, scientists have developed many commercially available NLO materials for application in the ultraviolet to mid-infrared regions, for example BaB 2 O 4 (BBO), 9 LiB 3 O 5 (LBO), 10 KH 2 PO 4 (KDP), 11 KTiOPO 4 (KTP), 12 AgGaQ 2 (Q = S, Se), 13,14 ZnGeP 2 (ZGP), 15 LiGaS 2 , 16 LiInSe 2 , 17 and GaSe. 18 In general, the following specifications must also be satisfied for a NLO crystal with suitable performance: 19 a non-centrosymmetric space group to perform the NLO function, an enough effective NLO coefficient (d eff > 0.39 pm V −1 ), a wide band gap (E g > 6.2 eV) and an acceptable birefringence (0.05-0.1) to achieve phase matching.…”
Section: Introductionmentioning
confidence: 99%
“…For this purpose, appropriate technologies for modifying the properties of semiconductors (doping from melt, diffusion doping, ion implantation and irradiation, temperature treatments, etc.) were developed [2][3][4][5][6][7]. In particular, it is common knowledge that the diffusion doping of GaAs by Cr allows the fabrication of efficient ionizing radiation detectors on the basis of such materials with electron lifetimes of 20-80 ns [4][5][6].…”
Section: Introductionmentioning
confidence: 99%