2005
DOI: 10.1021/la050176k
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Ternary CdSxSe1-x Deposited on Ag(111) by ECALE:  Synthesis and Characterization

Abstract: Morphology and electronic properties of CdS, CdSe, and the ternary compounds of formula CdSxSe1-x deposited on Ag(111) by ECALE have been characterized as a function of the composition. The number of the attainable x values is limited by the necessity of using well-defined CdS/CdSe deposition sequences. However, the quantitative analysis carried out by XPS and electrochemical stripping experiments indicates that the ECALE method has a good control on composition. The AFM images together with the electrochemica… Show more

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Cited by 41 publications
(29 citation statements)
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“…The crucial point in material electrodeposition is to control the dimensions, the stoichiometric ratio, and the crystallinity of the deposited structures. The electrochemical atomic layer epitaxy (EC-ALE) technique developed by Stickney [13] was proved to be a valid approach to control these parameters for the deposition of chalcogenide compounds on metallic substrates [14][15][16][17][18][19]. This method is based on the alternate underpotential deposition of atomic layers of the elements that form the compound, in a cycle that can be repeated as many times as desired.…”
Section: Introductionmentioning
confidence: 99%
“…The crucial point in material electrodeposition is to control the dimensions, the stoichiometric ratio, and the crystallinity of the deposited structures. The electrochemical atomic layer epitaxy (EC-ALE) technique developed by Stickney [13] was proved to be a valid approach to control these parameters for the deposition of chalcogenide compounds on metallic substrates [14][15][16][17][18][19]. This method is based on the alternate underpotential deposition of atomic layers of the elements that form the compound, in a cycle that can be repeated as many times as desired.…”
Section: Introductionmentioning
confidence: 99%
“…The under potential deposited Se was stripped in the positive scan of the first cycle so that the surface limited deposition peak of Se can also be observed in the second scan and it is almost the same shape as that in the first scan, the phenomenon of which was also reported by M. Foresti. 34 The peak located at −0.85 V (C2) gets stronger in the second scan indicating more intense bulk Se deposition thus the peak can be ascribed to bulk deposition. Figure 1c displays the cycle voltammogram curve of the TiO 2 NRs array film electrode in a Te precursor solution.…”
Section: Resultsmentioning
confidence: 96%
“…E-ALD exploits Surface-Limited Reactions (SLRs), such as Underpotential Deposition (UPD), thus achieving the layer-by-layer growth of various compound semiconductors [8,9,10,11,12,13,14,15,16,17]. The Nernst equation predicts the redox potential necessary to reduce metal ion A onto a substrate of the same element A.…”
Section: Introductionmentioning
confidence: 99%