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Thin films are usually obtained by depositing atoms with a continuous flux.We show that using a chopped flux changes the growth and the morphology of the film. A simple scaling analysis predicts how the island densities change as a function of the frequency of the chopped flux in simple cases where aggregation is irreversible. These predictions are confirmed by computer simulations.We show that the model can be used to obtain information on the diffusion or the evaporation of the adatoms. The model is also useful to understand the growth of thin films prepared by pulsed sources.Typeset using REVT E X 1 One of the main interests of usual deposition techniques such as Molecular Beam Epitaxy [1] is that the structure of the deposited films is to a large extent determined by kinetic factors, as opposed to thermodynamic equilibrium. This allows to "play games" [2] with the different growth parameters (incident flux of particles, diffusion coefficient of an adatom . . . ) in order to obtain different film morphologies. A simple example is given by the quantity of islands grown on a substrate at low enough temperatures : it is known that the number of islands at saturation is given by (F/D) 1/3 [3][4][5] where F is the incident flux and D the diffusion coefficient. Then, by increasing the flux or decreasing the diffusion constant (by lowering the substrate temperature), one can adjust the saturation number of islands grown on the substrate. In this sense, each kinetic factor is a "handle" on the system, allowing to control the morphology of the films. We introduce in this Letter a new kinetic handle, which should enable a larger control over film growth : the chopping of the incident flux. We note that this flux modulation is intrinsic to other deposition techniques such as cluster laser vaporization (the laser is pulsed [6]). It is therefore important to understand how growth proceeds in the presence of a modulated flux if one is to be able to interpret experiments performed in these conditions. For example, one may wonder whether the usual growth theories [3][4][5] can be used by replacing the continuous flux by the average value of the chopped flux over a cycle. In the following, we will show that this is not the case, and that the growth of the film is profoundly changed by the modulation of the incident flux for the case of growth with irreversible aggregation (critical island size 1, see [3][4][5][7][8][9]. Conversely, we show what kind of information can be derived from experiments carried under these conditions.The basic idea of our method is that if instead of using a continuous flux we use a chopped flux to grow a film, the number of islands formed on a substrate will depend on the chopping frequency f and on d, the fraction of the period the flux is "on" (see Fig. 1).This dependence is due to the fact that the free particle concentration on the surface does not reach its steady state concentration instantaneously, but only after a time which we will call τ m . Then, if the timescale of the chopping (...
Thin films are usually obtained by depositing atoms with a continuous flux.We show that using a chopped flux changes the growth and the morphology of the film. A simple scaling analysis predicts how the island densities change as a function of the frequency of the chopped flux in simple cases where aggregation is irreversible. These predictions are confirmed by computer simulations.We show that the model can be used to obtain information on the diffusion or the evaporation of the adatoms. The model is also useful to understand the growth of thin films prepared by pulsed sources.Typeset using REVT E X 1 One of the main interests of usual deposition techniques such as Molecular Beam Epitaxy [1] is that the structure of the deposited films is to a large extent determined by kinetic factors, as opposed to thermodynamic equilibrium. This allows to "play games" [2] with the different growth parameters (incident flux of particles, diffusion coefficient of an adatom . . . ) in order to obtain different film morphologies. A simple example is given by the quantity of islands grown on a substrate at low enough temperatures : it is known that the number of islands at saturation is given by (F/D) 1/3 [3][4][5] where F is the incident flux and D the diffusion coefficient. Then, by increasing the flux or decreasing the diffusion constant (by lowering the substrate temperature), one can adjust the saturation number of islands grown on the substrate. In this sense, each kinetic factor is a "handle" on the system, allowing to control the morphology of the films. We introduce in this Letter a new kinetic handle, which should enable a larger control over film growth : the chopping of the incident flux. We note that this flux modulation is intrinsic to other deposition techniques such as cluster laser vaporization (the laser is pulsed [6]). It is therefore important to understand how growth proceeds in the presence of a modulated flux if one is to be able to interpret experiments performed in these conditions. For example, one may wonder whether the usual growth theories [3][4][5] can be used by replacing the continuous flux by the average value of the chopped flux over a cycle. In the following, we will show that this is not the case, and that the growth of the film is profoundly changed by the modulation of the incident flux for the case of growth with irreversible aggregation (critical island size 1, see [3][4][5][7][8][9]. Conversely, we show what kind of information can be derived from experiments carried under these conditions.The basic idea of our method is that if instead of using a continuous flux we use a chopped flux to grow a film, the number of islands formed on a substrate will depend on the chopping frequency f and on d, the fraction of the period the flux is "on" (see Fig. 1).This dependence is due to the fact that the free particle concentration on the surface does not reach its steady state concentration instantaneously, but only after a time which we will call τ m . Then, if the timescale of the chopping (...
Ullmann‐type coupling is the most widely used on‐surface reaction to form rationally designed bottom‐up molecular nanoarchitectures. A commonly observed reaction product in this reaction is an organometallic phase, however little is known about the formation of this phase. The on‐surface polymerization of the prochiral precursor 6,12‐dibromochrysene (DBCh) on Ag(111) is studied. Upon annealing of DBCh on Ag(111), a linear organometallic polymer forms. However, the delicate energy balance involved in the polymerization of DBCh is such that, at room temperature, several reaction intermediates, which eventually lead to the formation of the organometallic polymer, can be observed experimentally. Organometallic monomers, dimers, and trimers are finds, that self‐assemble into distinct networks. The experimental availability of these reaction intermediates provides key insights into the formation of the organometallic polymer. Comparing the chirality of the intermediates and the polymer sheds additional light on the reaction mechanism leading to the formation of the polymer. The main finding is that the organometallic polymer is not formed by a simple coupling of the reaction intermediates, but rather requires the breaking and re‐establishing of the C─Ag bonds. Additionally, a Br‐enhanced growth mode is observed, where the split‐off halogens align the polymers, which results in an increased polymer length.
The controllable nanogap structures offer an effective way to obtain strong and tunable localized surface plasmon resonance (LSPR). A novel hierarchical plasmonic nanostructure (HPN) is created by incorporating a rotating coordinate system into colloidal lithography. In this nanostructure, the hot spot density is increased drastically by the long‐range ordered morphology with discrete metal islands filled in the structural units. Based on the Volmer–Weber growth theory, the precise HPN growth model is established, which guides the hot spot engineering for improved LSPR tunability and strong field enhancement. The hot spot engineering strategy is examined by the application of HPNs as the surface‐enhanced Raman spectroscopy (SERS) substrate. It is universally suitable for various SERS characterization excited at different wavelengths. Based on the HPN and hot spot engineering strategy, single‐molecule level detection and long‐range mapping can be realized simultaneously. In that sense, it offers a great platform and guides the future design for various LSPR applications like surface‐enhanced spectra, biosensing, and photocatalysis.
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