Abstract:Recent advances in technology leads to increasing high speed performance of submicrometer
electron devices by the scaling of both process and geometry. In order to aid the design of
these devices it is necessary to utilize powerful numerical simulation tools. In an industrial
environment the simulation codes based on the Drift-Diffusion models have been widely
used. However the shrinking dimension of the devices causes the Drift-Diffusion based simulators
to become less accurate. Then it is necessary to utiliz… Show more
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