2010
DOI: 10.1016/j.jcrysgro.2010.07.057
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Tetragonal tungsten oxide nanobelts synthesized by chemical vapor deposition

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Cited by 60 publications
(25 citation statements)
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“…Among them, the nanobelt delivers a large width‐radius ratio with excellent “surface accessibility” as compared to other traditional cylindrical ones, which would be valuable to construct PEC photoelectrode. Up to now, many efforts have been put to the growth of WO 3 nanobelts, including chemical vapor deposition (CVD), hydrothermal,electrospinning, etc. However, few works have been progressed on the porous WO 3 nanobelts, which might have better photoelectrochemical performances for water splitting, due to their relatively higher specific surface areas with interconnected mesochannels …”
Section: Introductionmentioning
confidence: 99%
“…Among them, the nanobelt delivers a large width‐radius ratio with excellent “surface accessibility” as compared to other traditional cylindrical ones, which would be valuable to construct PEC photoelectrode. Up to now, many efforts have been put to the growth of WO 3 nanobelts, including chemical vapor deposition (CVD), hydrothermal,electrospinning, etc. However, few works have been progressed on the porous WO 3 nanobelts, which might have better photoelectrochemical performances for water splitting, due to their relatively higher specific surface areas with interconnected mesochannels …”
Section: Introductionmentioning
confidence: 99%
“…Relatively, the synthesis of tungsten oxide nanobelt structure is rarely reported. Pei and his colleagues reported a hot‐wall chemical vapor deposition (CVD) method to grow WO 3 nanobelts on Si substrates, but it's hard to exfoliate for other processing. It still remains challenging to find a facile and practicable strategy to synthesize well defined colloidal tungsten oxide nanobelts.…”
mentioning
confidence: 99%
“…The tungsten and tin oxide hydrate layers have been prepared by several processes including gas-and solutionphase depositions. [5][6][7][8][9] The solution process has several advantages over the gas-phase deposition as already reported. [10][11][12] Direct anodic and cathodic depositions have been proposed by our group, and the ability has been approved by preparations of ZnO, Cu 2 O, and CuO semiconductors.…”
mentioning
confidence: 91%