2007
DOI: 10.1107/s1600536807001043
|View full text |Cite
|
Sign up to set email alerts
|

Tetrakis(1H-benzimidazole-κN3)(sulfato-κO)copper(II) dimethyl sulfoxide solvate

Abstract: Key indicatorsSingle-crystal X-ray study T = 293 K Mean (C-C) = 0.006 Å Disorder in solvent or counterion R factor = 0.041 wR factor = 0.092 Data-to-parameter ratio = 12.9For details of how these key indicators were automatically derived from the article, see SO, displays a square-pyramidal coordination geometry formed by four benzimidazole ligands and a sulfate anion. The molecules are linked by N-HÁ Á ÁO and C-HÁ Á ÁO hydrogen bonds, forming an extensive two-dimensional network in the ab plane.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2011
2011
2023
2023

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(1 citation statement)
references
References 9 publications
0
1
0
Order By: Relevance
“…During the etching process, highly concentrated Cu 2+ can catalyze a reaction that forms undesirable defects on graphene . Such catalytic activity of Cu 2+ ions can be suppressed by adding metal-chelating agents such as BI as it readily forms a coordination compound, Cu[(BI) 4 ]SO 4 (aq), during the etching process . The transferred BI-graphene on arbitrary substrates such as SiO 2 /Si wafers and PET films are shown in Figure S1, Supporting Information.…”
Section: Resultsmentioning
confidence: 99%
“…During the etching process, highly concentrated Cu 2+ can catalyze a reaction that forms undesirable defects on graphene . Such catalytic activity of Cu 2+ ions can be suppressed by adding metal-chelating agents such as BI as it readily forms a coordination compound, Cu[(BI) 4 ]SO 4 (aq), during the etching process . The transferred BI-graphene on arbitrary substrates such as SiO 2 /Si wafers and PET films are shown in Figure S1, Supporting Information.…”
Section: Resultsmentioning
confidence: 99%