2019
DOI: 10.1002/admi.201801787
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Textured Poling of the Ferroelectric Dielectric Layer for Improved Organic Field‐Effect Transistors

Abstract: the amorphous silicon benchmark of 1 cm 2 Vs −1 , application of organic FETs in displays and sensors have now become a reality. Organic FETs differ from metal oxide semiconductor FET (MOSFET) in several ways; most organic FETs operate in the accumulation region compared to the inversion operating region of MOSFETs. The metal-semiconductor and the semiconductor-dielectric interfaces play a vital role in charge transport properties. In particular, the dielectric interface is notorious for charge trapping. As a … Show more

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Cited by 13 publications
(22 citation statements)
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References 30 publications
(34 reference statements)
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“…Furthermore, in OFETs, charge transport is also affected by interfaces, which can even mask the intrinsic dependence of mobility on molecular structure and packing. As shown in Figure 1(a), the metal/semiconductor and semiconductor/dielectric interfaces are the places for the charge injection and transport, respectively, which play a fundamental role in the operation of OFETs [5,[59][60][61][62][63][64][65][66]. In particular, static structural and energetic disorder encountered by the charges moving along the interface results in percolation motion with certain sites becoming rate limiting for the transport along the interface [67][68][69].…”
Section: Overview Of Charge Transport In Ofetsmentioning
confidence: 99%
“…Furthermore, in OFETs, charge transport is also affected by interfaces, which can even mask the intrinsic dependence of mobility on molecular structure and packing. As shown in Figure 1(a), the metal/semiconductor and semiconductor/dielectric interfaces are the places for the charge injection and transport, respectively, which play a fundamental role in the operation of OFETs [5,[59][60][61][62][63][64][65][66]. In particular, static structural and energetic disorder encountered by the charges moving along the interface results in percolation motion with certain sites becoming rate limiting for the transport along the interface [67][68][69].…”
Section: Overview Of Charge Transport In Ofetsmentioning
confidence: 99%
“…The film was poled at 135 • C for 30 min and at room temperature for 30 min. The temperature for annealing the film was chosen because it is just above the ferroelectric-paraelectric transition temperature of PVDF-TrFE [24]. The field was such that a negative bias was applied to the evaporated bottom-gate to ensure that the gate voltage during FET operation would not act to reorient the dipoles.…”
Section: Materials Andmentioning
confidence: 99%
“…Gold electrodes of 50 nm were thermally evaporated onto the substrates which were patterned with a mask for a channel length of 1000 μm and a channel width of 50 μm. Prior work shows that an application of a lateral electric field parallel to the bottom of the PVDF-TrFE layer after vertical poling reduces the gate leakage current [24]. This texturepoling condition in another sample was achieved by evaporating aluminum electrodes which flank the central gate electrode on either side, as shown in Figure 1b.…”
Section: Materials Andmentioning
confidence: 99%
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