Textured silicon: A selective absorber for solar thermal conversion

Gittleman, J. I.; Sichel, E. K.; Lehmann, H. W.; Widmer, R.

doi:10.1063/1.90953

Cited by 93 publications

(38 citation statements)

References 5 publications

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“…However, we have also seen that it is not possible to make a classical diffraction grating a good selective absorber for use in unpolarized light . This, together with promising experimental studies [2,[9][10][11][12][13][14][15][16][17][18], suggests the value of extending our results to crossed diffraction gratings in the small period limit .…”

Section: Discussionsupporting

confidence: 58%

“…The traditional solution to this problem has been to place one or more anti-reflecting films on top of the interface . However, in recent years interest has been growing in another possibility-that of roughening or texturing the interface in such a fashion as to yield a reduced reflectance [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19] . These studies have shown that the effects of roughening an interface are often similar to those obtained if a graded refractive index film is deposited on the interface .…”

Section: Introductionmentioning

confidence: 99%

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Diffraction Gratings in the Quasi-static Limit

Bell

Derrick

McPhedran

1982

Optica Acta: International Journal of Optics

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For gratings having an arbitrary symmetric profile, we prove that when the period becomes much finer than the wavelength the grating becomes equivalent to a graded uniaxial layer . We show for one polarization that this quasi-static equivalence holds when the ratio of wavelength to grating period exceeds 40 . We also present a simple physical model which explains the anisotropic nature of the equivalent layer . We take the case of a finely-textured copper surface, and show that it can be a good selective absorber for polarized light, but that its performance in unpolarized' light is much less satisfactory .

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Section: Discussionsupporting

confidence: 58%

Section: Introductionmentioning

confidence: 99%

Diffraction Gratings in the Quasi-static Limit

Bell

Derrick

McPhedran

1982

Optica Acta: International Journal of Optics

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“…18 In 2001, Zaidi et al published an extensive study on solar cells textured by reactive ion etching (RIE) in SF 6 and O 2 , paying, however, little attention to the actual dry etching process. 19 During the last decade, only few publications treated Black Silicon formation by RIE in SF 6 and O 2 .…”

mentioning

confidence: 99%

The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

Steglich

Käsebier

Zilk

et al. 2014

Journal of Applied Physics

114

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Black Silicon nanostructures are fabricated by Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) in a gas mixture of SF6 and O2 at non-cryogenic temperatures. The structure evolution and the dependency of final structure geometry on the main processing parameters gas composition and working pressure are investigated and explained comprehensively. The optical properties of the produced Black Silicon structures, a distinct antireflection and light trapping effect, are resolved by optical spectroscopy and conclusively illustrated by optical simulations of accurate models of the real nanostructures. By that the structure sidewall roughness is found to be critical for an elevated reflectance of Black Silicon resulting from non-optimized etching processes. By analysis of a multitude of structures fabricated under different conditions, approximate limits for the range of feasible nanostructure geometries are derived. Finally, the technological applicability of Black Silicon fabrication by ICP-RIE is discussed

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“…Chlorine-and uorine-based plasmas have been used to texture silicon wafers in this way, [111][112][113][114] with reectances less than 5% across the wavelength range of 300 nm to 1 mm demonstrated. In the case of maskless SF 6 /O 2 etching, deep texturing of silicon can be achieved by etching through a thin oxide layer.…”

Section: Random Subwavelength Texturingmentioning

confidence: 99%

Light Capture

Boden

Temple

2014

Materials Challenges

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The efficient capture of light is an essential factor for consideration in all solar cell designs. This chapter explores antireflective and light trapping schemes designed to reduce optical losses in solar cells with the aim of improving device efficiency. After a survey of the different mechanisms available for antireflection and light trapping, the various schemes employing these mechanisms are described. This begins with the traditional methods of thin film antireflective coatings and large (micron) scale texturing before moving onto more recent developments in the use of subwavelength texturing, taking inspiration from natural ‘moth-eye’ antireflective surfaces. Finally, the rapidly emerging field of plasmonics for photovoltaics is explored in which metal nanoparticles scatter incoming light through the generation of localized surface plasmons. In each section, the simulation techniques used for design optimization are introduced and methods for experimental realization and implementation in a range of photovoltaic devices are described. The associated increases in cost and complexity conferred to the solar cell fabrication process are also considered because these are the main hindrances to wide scale adoption of new strategies of light capture.

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Textured silicon: A selective absorber for solar thermal conversion

Cited by 93 publications

References 5 publications

Diffraction Gratings in the Quasi-static Limit

Diffraction Gratings in the Quasi-static Limit

The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

Light Capture

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