Thin organic films with oxygen‐bearing functional groups (hydroxyl, carboxyl, …) were prepared by “co‐polymerizing” gas mixtures of ethylene (C2H4) and one of several O‐containing oxidizer molecules, O2, CO2, or N2O. This was done either by vacuum‐ultraviolet (VUV) photo‐polymerization or by low‐pressure r.f. plasma‐assisted CVD. The gas mixture ratio, R, permits one to control total oxygen concentration, [O], as well as the relative proportions of the various functionalities. Analyses were performed by XPS (with or without chemical derivatization using TFAA to determine [OH] content), and IRRAS‐FTIR. Temporal and structural stability (mass change) of deposits under exposure to air or water was examined; altogether, data confirmed different reaction pathways for VUV and PECVD.