The algorithm of development safe methods for depositing metallic coatings by CVD-method of organometallic compounds

Abstract

The CVD-method of organometallic compounds is a universal method of obtaining functional metal coatings on substrates of various chemical composition and configuration. The essence of the method is the evaporation (sublimation) of the organometallic compound in the reactor of the metallization unit and the deposition of metal on the substrate heated to the decomposition temperature of the initial reagent. This article presents the results of research work group of authors to create the algorithm of development safe methods foe depositing metallic coatings by CVD-method. The increase of the industrial safety of metallization is achieved due to automation of the process, equipping the plant for the application of metal coatings with locking and alarm systems. The ecological nature of the CVD-method, in which extremely hazardous substances were used as initial reagents, was ensured by sealing equipment and conducting the process in a closed cycle with the possibility of re-use of the reagents. This eliminated the flow of pollutants into the environment and allowed the implementation of the principles of resource and energy conservation.

Deposition of carbonitride titanium coatings by magnetron sputtering and its effect on tribo-mechanical properties

“…Today, the use of wear resistant coatings in harsh working conditions is becoming more and more important [ [1], [2], [3]]. For this reason, a number of studies have been devoted to the problems of creating thin hard coatings and their application in the production of machine parts and tools [ [4], [5], [6], [7]]. Transition metal nitrides are widely used as functional coatings, which is justified by a set of their properties, such as good conductivity, hardness, high melting point, chemical resistance, and wear resistance [ [8], [9]].…”