Proceedings of International Conference on Planarization/CMP Technology 2014 2014
DOI: 10.1109/icpt.2014.7017276
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The Amorphous-Si CMP process improvement for L14 nm FinFET technology node

Y. T. Li
1
,
Po-Chin Huang
2
,
Fu-Shou Tsai
3
et al.
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