The application criterion of model-based optical proximity correction in a low k1 process

Lee, Doo-Youl; Kim, In-Sung; Jung, Sunggon; Jung, Myoung-Ho; Park, Joo-On; Oh, Seok-Hwan; Woo, Sang-Gyun; Cho, Han-Ku; Moon, Joo-Tae

doi:10.1117/12.599013

Optical Microlithography XVIII 2005

DOI: 10.1117/12.599013

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The application criterion of model-based optical proximity correction in a low k1 process

Doo-Youl Lee

In-Sung Kim

Sunggon Jung

et al.

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The application criterion of model-based optical proximity correction in a low k1 process

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