The appraisement of lighting

Paterson, Carrie

doi:10.1088/0959-5309/50/1/313

Cited by 4 publications

(1 citation statement)

References 1 publication

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In short, the presence of the magnetic field opens operating regimes that are otherwise not possible. While the application of a magnetic field will induce non-uniformities in the discharge because of an induced E × B drift, through temporal manipulation of the magnetic field, the plasma uniformity across the wafer being processed can be controlled to some degree [3][4][5].…”

Section: Introductionmentioning

confidence: 99%

RF discharge under the influence of a transverse magnetic field

Barnat¹,

Miller²,

Paterson³

2008

Plasma Sources Sci. Technol.

View full text Add to dashboard Cite

We examine the effects of an externally applied magnetic field (0-150 G) on an argon discharge generated capacitively at 13.56 MHz, in a Gaseous Electronics Conference reference cell. Dependence of the electrical characteristics of the discharge are measured as functions of applied magnetic field, rf power and argon pressure. At fixed power the rf voltage decreases with increasing magnetic field. Likewise, the impedance of the discharge is capacitive but becomes more resistive as the electron mobility becomes limited by the magnetic field. The impact of the magnetic field is found to diminish as the cyclotron frequency of the electron becomes smaller than that of the collision frequency of the electron. We also measure the impact the magnetic field has on the distribution of the plasma in vertical planes parallel and perpendicular to the magnetic field using Langmuir probes, optical emission and laser-induced fluorescence. It is found that the distribution of the plasma remains symmetric in the plane parallel to the magnetic field and becomes skewed in the plane perpendicular to the magnetic field. The degree of skew depends on the optical state probed. Finally, we examine the spatial distribution and the temporal evolution of the electric fields in the plasma. It is shown that with the presence of the magnetic field, the thickness of the sheath is reduced and that most of the voltage drop is contained within the sheath. Consistent with dc voltage trends, there was no significant sheath reversal observed at higher magnetic fields. Comparisons of the results presented here are made with trends predicted by models and simulations found in the literature.

show abstract

Section: Introductionmentioning

confidence: 99%

RF discharge under the influence of a transverse magnetic field

Barnat¹,

Miller²,

Paterson³

2008

Plasma Sources Sci. Technol.

View full text Add to dashboard Cite

show abstract

Clifford Copland Paterson, 1879 - 1948

1949

Obit. Not. Fell. R. Soc.

View full text Add to dashboard Cite

Clifford Copland Paterson was born on 17 October 1879 at Stoke Newington, and was the son of Frederick Paterson, a tanner and leather merchant. In 1892, after attending a private school near his home, he entered Mill Hill, then under the headmastership of McClure, later Sir John; he went on the modern side and specialized in the study of engineering and physics. Though he reached the sixth form and gained prizes for French and German, his school career seems, on the whole, to have been undistinguished and to have given little promise of the outstanding ability that was to develop later. After leaving Mill Hill in 1896, Paterson embarked on a comprehensive training, both theoretical and practical, in general and electrical engineering. He first spent a year at Finsbury Technical College and then served a general engineering apprenticeship with Messrs George Wailes and Company of London, and subsequently with Messrs Mirrlees, Watson and Company of Glasgow. In 1901 he entered Faraday House, under Alexander Russell, as a special studentassistant in the Testing Department. Shortly after, he published, jointly with Russell, his first paper, which dealt with sparking in switches. The general adoption, about this time, of higher supply voltages made the rating of switches for use in direct current lighting circuits a matter of pressing importance. Widely different ratings were being given by different makers for switches of substantially the same size and length of break. The primary object of the work was therefore to determine detailed relations between current, voltage and the resulting spark length, so as to enable manufacturers to predict the behaviour of their switches under various conditions.

show abstract

A Proposed Luminance Basis for a Lighting Code

Hopkinson¹

1965

Transactions of the Illuminating Engineering Society

View full text Add to dashboard Cite

Lighting codes in terms of levels of illumination incident on the visual task have served a valuable purpose for over fifty years. When based on sound principles, they are still valid for the lighting on the work. The lighting of the building interior, however, should not have to be constrained by the lighting on any specific visual task, and should be planned in relation to the design of the whole building. Experiment and observation show that the degree of satisfaction given by lighting is regulated by the brightness pattern in the visual field. Good lighting requires selective illumination on the work, together with an environment free from excessive brightness and glare. The relation between the work lighting and the building lighting should properly be developed in terms of apparent brightness, and an outline is given ofthe research programme necessary for this purpose. Meanwhile an interim stage is proposed for a lighting code to be based on existing knowledge of visual comfort in relation to brightness distribution in the visual field.

show abstract

The appraisement of lighting

Cited by 4 publications

References 1 publication

RF discharge under the influence of a transverse magnetic field

RF discharge under the influence of a transverse magnetic field

Clifford Copland Paterson, 1879 - 1948

A Proposed Luminance Basis for a Lighting Code

Contact Info

Product

Resources

About