2016
DOI: 10.1016/j.commatsci.2016.03.033
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The carbon-substitutional–carbon-interstitial (CsCi) defect pair in silicon from hybrid functional calculations

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Cited by 6 publications
(3 citation statements)
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“…A large number of simulation papers has been devoted to carbon defects in silicon in the past, starting from the early 1990s. [ 4–6,10–19 ] In most of the cases, defects containing two heteroatoms have been considered, possibly in combination with intrinsic defects such as V (vacancy) and Si i ( i stands for interstitial): V , N , and O in ref. [18], V and P in ref.…”
Section: Introductionmentioning
confidence: 99%
“…A large number of simulation papers has been devoted to carbon defects in silicon in the past, starting from the early 1990s. [ 4–6,10–19 ] In most of the cases, defects containing two heteroatoms have been considered, possibly in combination with intrinsic defects such as V (vacancy) and Si i ( i stands for interstitial): V , N , and O in ref. [18], V and P in ref.…”
Section: Introductionmentioning
confidence: 99%
“…A large number of papers based on quantum mechanical approaches have been devoted to carbon defects in silicon in the past, starting from the early nineties. [10][11][12][15][16][17][18][19][20][21][22][23][24] In most of the cases, Associating an experimental infrared (IR), Raman or EPR signal to a specific defect is always challenging and, very often, controversial. This is all the more true when more than a single defect is present, because the features of one defect can be altered by the other.…”
Section: Introductionmentioning
confidence: 99%
“…A large number of papers based on quantum mechanical approaches have been devoted to carbon defects in silicon in the past, starting from the early nineties 10–12,15–24 . In most of the cases, defects containing two heteroatoms have been considered, possibly in combination with intrinsic defects such as V (vacancy) and Si i : V, N, and O in Reference 23, V and P in Reference 24, C i and O i in Reference 21 and 22, H and C i in Reference 12.…”
Section: Introductionmentioning
confidence: 99%