The control of time-dependent buckling patterns in thin confined elastomer film

Abstract

Low energy metal ion implantation has been used to combine an easy "bottom-up" way of creating and tuning different topographic structures on submicron to micrometer scales with the embedding of a metallic element-rich functionalized layer at the surface for a variety of scientific and technological applications. The self-organizing and complex patterns of functionalized topographic structures are highly dependent on the implanted metal ion species, variations in the geometric confinement of the buckled areas on the larger unmodified elastomer film, and the boundary conditions of the buckled regions. Systematic investigations of these dependencies have been carried out via optical and atomic force microscopy, and confirmed with crosssectional transmission electron microscopy. Low energy metal ion implantation has been used to combine an easy "bottom-up" way of creating and tuning different topographic structures on submicron to micrometer scales with the embedding of a metallic element-rich functionalized layer at the surface for a variety of scientific and technological applications. The self-organizing and complex patterns of functionalized topographic structures are highly dependent on the implanted metal ion species, variations in the geometric confinement of the buckled areas on the larger unmodified elastomer film, and the boundary conditions of the buckled regions. Systematic investigations of these dependencies have been carried out via optical and atomic force microscopy, and confirmed with cross-sectional transmission electron microscopy.

Metastable Patterning of Plasma Nanocomposite Films by Incorporating Cellulose Nanowhiskers

“…These forces thus equilibrate and anchor the film at many points on the substrates such that overall the tensile stress averages in all direction and out-of-plane deformation or buckling occurs. The role of CNWs in the nanocomposite films can thus be considered to be similar to previously mentioned artificial surface patterns, or ion implantation, in controlling internal stress and film morphology. In that view, the differences in adhesion between CNWs/substrate and MA/substrate can play a role in the deposition of CNWs as artificial defect points.…”

“…53 Another way to control buckling patterns in elastomeric substrates includes focused ion beam irradiation 54,55 or metal implantation. 56 Thus, local stress concentrations around incorporated defects generally provide a versatile bottom-up way to create and control discrete topographical morphologies.…”

“…In many experiments, buckling during plasma treatment depends on the substrate thickness and is better controlled by the relaxation of a prestrained elastomeric substrate in uni- or biaxial mode . Another way to control buckling patterns in elastomeric substrates includes focused ion beam irradiation , or metal implantation . Thus, local stress concentrations around incorporated defects generally provide a versatile bottom-up way to create and control discrete topographical morphologies.…”