2016
DOI: 10.1016/j.corsci.2016.01.007
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The crystallographic template effect assisting the formation of stable α-Al2O3 during low temperature oxidation of Fe–Al alloys

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Cited by 34 publications
(7 citation statements)
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“…This provides a crucial mechanistic understanding of the large O 2 release from the aforesaid instantaneous solid−solid phase transitions, prompted by the thermal decomposition of interfacial stabilizing C skins leading to the simultaneous release of the excess CO 2 . Subsequent HRTEM examination of the final TGA burn byproducts in Figure 5b (inset for SAED patterns) indicates the final products to be highly crystalline α-Al 2 O 3 particles with characteristic d-spacing of ∼0.209 nm, 49 which supports our earlier HTXRD data in Figure 4a.…”
Section: Resultssupporting
confidence: 82%
“…This provides a crucial mechanistic understanding of the large O 2 release from the aforesaid instantaneous solid−solid phase transitions, prompted by the thermal decomposition of interfacial stabilizing C skins leading to the simultaneous release of the excess CO 2 . Subsequent HRTEM examination of the final TGA burn byproducts in Figure 5b (inset for SAED patterns) indicates the final products to be highly crystalline α-Al 2 O 3 particles with characteristic d-spacing of ∼0.209 nm, 49 which supports our earlier HTXRD data in Figure 4a.…”
Section: Resultssupporting
confidence: 82%
“…We also found that the transformation to a-Al 2 O 3 was promoted on binary Fe-Al alloys with higher Fe content [17]. P. Brito et al also found same beneficial effect of Fe on promoting a-Al 2 O 3 scale formation on the binary Fe-Al alloys at lower temperature, 700°C [18]. However, it was difficult to clarify which element, Fe or Al, had a stronger effect on the transformation since Fe and Al contents cannot be changed independently in the binary Fe-Al system.…”
Section: Introductionsupporting
confidence: 52%
“…Even more easily, α-Al 2 O 3 can be obtained on appropriate seed layers where the Al 2 O 3 films are deposited on. For instance, α-Al 2 O 3 has been grown at 1000 °C on Ti­(C,N) and Ti 3 O 5 /Ti 4 O 7 surfaces by chemical vapor deposition (CVD), ,,, at 700 °C on α-Fe 2 O 3 formed during thermal oxidation of metal alloys that contain Fe and Al, and at 700–750 °C on CrN in magnetron sputtering (MS) experiments . Using the MS method and α-Al 2 O 3 as a component of a sputtering target, α-Al 2 O 3 films have been obtained on silicon substrates at 550 °C .…”
Section: Introductionmentioning
confidence: 99%