The CVD of Nanocomposites Fabricated via Ultrasonic Atomization

Ross, April D.; Gleason, Karen K.

doi:10.1002/cvde.200506368

Cited by 13 publications

(14 citation statements)

References 25 publications

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“…Profili et al [8] implemented a one-step approach for the deposition of ZnO-SiO2 NC coatings on wood by the atomization of a stable suspension of ZnO dispersed in hexamethyldisiloxane (HMDSO) in an atmospheric pressure dielectric barrier discharge (DBD). Ross et al [9] elaborated composite films using an ultrasonic atomizer and a PECVD system using Tetraethoxysilane (TEOS) as a matrix precursor and polystyrene nanoparticles with a mean size of 96 nm. The pressure in the specific system was varied between 100 and 500 mTorr.…”

Section: Introductionmentioning

confidence: 99%

TiO₂–SiO₂ nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O₂/HMDSO low-pressure plasma

Mitronika¹,

Profili²,

Goullet³

et al. 2020

J. Phys. D: Appl. Phys.

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TiO2 nanoparticles (NPs), 3 nm in size, were injected inside a very-low-pressure O2 plasma reactor using a liquid injector and following an iterative injection sequence.Simultaneously, hexamethyldisiloxane (HMDSO) vapor precursor was added to create a SiO2 matrix and a TiO2-SiO2 nanocomposite (NC) thin film. Both the liquid injection and vapor precursor parameters were established to address the main challenges observed when creating NCs. In contrast to most aerosol-assisted plasma deposition processes, Scanning/Transmission Electron Microscopy (S/TEM) indicated isolated (i.e. non-agglomerated) NPs distributed in a rather uniform way in the matrix. The fraction of the TiO2 NPs inside the SiO2 matrix was estimated by SEM, Spectroscopic Ellipsometry (SE), and X-ray Photoelectron Spectroscopy.All techniques provided coherent values, with percentages between 12 and 19%. Despite the presence of TiO2 NPs, SE measurements confirmed that the plasma-deposited SiO2 matrix was dense with an optical quality similar to the one of thermal silica. Finally, the percentage of TiO2 NPs inside the SiO2 matrix and the effective refractive index of the NCs can be tuned through judicious control of the injection sequence.

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Section: Introductionmentioning

confidence: 99%

TiO₂–SiO₂ nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O₂/HMDSO low-pressure plasma

Mitronika¹,

Profili²,

Goullet³

et al. 2020

J. Phys. D: Appl. Phys.

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“…It is reported that incorporation of IF-WS 2 nanoparticles into coatings would offer considerable improvements on tribological performance [13,14] and adjust hydrophobic/hydrophilic behavior of the coating surface [15]. Recently, aerosol-assisted chemical vapor deposition (AACVD) has been adapted to synthesize inorganic nanocomposite coatings from the dispersion or colloid of nanoparticles [16,17]. We have also incorporated IF-WS 2 nanoparticles into Cr 2 O 3 coating using AACVD [18].…”

Section: Introductionmentioning

confidence: 99%

Nanocomposite Coatings Codeposited with Nanoparticles Using Aerosol‐Assisted Chemical Vapour Deposition

Hou

Choy

Brun

et al. 2013

Journal of Nanomaterials

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Incorporating nanoscale materials into suitable matrices is an effective route to produce nanocomposites with unique properties for practical applications. Due to the flexibility in precursor atomization and delivery, aerosol-assisted chemical vapour deposition (AACVD) process is a promising way to synthesize desired nanocomposite coatings incorporating with preformed nanoscale materials. The presence of nanoscale materials in AACVD process would significantly influence deposition mechanism and thus affect microstructure and properties of the nanocomposites. In the present work, inorganic fullerene-like tungsten disulfide (IF-WS2) has been codeposited with Cr2O3coatings using AACVD. In order to understand the codeposition process for the nanocomposite coatings, chemical reactions of the precursor and the deposition mechanism have been studied. The correlation between microstructure of the nanocomposite coatings and the codeposition mechanism in the AACVD process has been investigated. The heterogeneous reaction on the surface of IF-WS2nanoparticles, before reaching the substrate surface, is the key feature of the codeposition in the AACVD process. The agglomeration of nanoparticles in the nanocomposite coatings is also discussed.

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“…The first report using a low-pressure plasma system, aiming at the simultaneous injection of the NPs in a solution and the injection of the matrix precursor using the PECVD technique, has been proposed by Ross et Gleason [126] in 2006. These authors report that the atomization of the solution is accomplished by a 40 kHz ultrasonic atomizer (Sonics and Materials, model VC134-AT with custom probe) located at the top of the reactor.…”

Section: Low-pressure-based Systemsmentioning

confidence: 99%

Hybrid approaches coupling sol–gel and plasma for the deposition of oxide-based nanocomposite thin films: a review

et al. 2021

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In view of developing new materials with enhanced properties, such as nanocomposite (NC) thin films, special interest has been given in optimizing the deposition processes themselves. The latter, if well selected, could give the freedom to control the NCs synthesis and final properties. Attempting to overcome severe challenges observed when creating NC or oxide-based NC film, hybrid approaches combining injection of colloidal solutions and plasma processes have been proposed. This review focuses on oxide-based NCs, using as an example the TiO2 NPs and SiO2 matrix as NCs, while investigating their optical and dielectric properties. Additionally, this review presents the state-of-the-art in processes for the preparation of the NCs. The major categories of hybrid approaches coupling sol–gel and plasma processes are given. Finally, a comparative study among the published works is provided, aiming in highlighting the impact that each approach has on the physical and chemical characteristics of the produced NCs.

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The CVD of Nanocomposites Fabricated via Ultrasonic Atomization

Cited by 13 publications

References 25 publications

TiO₂–SiO₂ nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O₂/HMDSO low-pressure plasma

TiO₂–SiO₂ nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O₂/HMDSO low-pressure plasma

Nanocomposite Coatings Codeposited with Nanoparticles Using Aerosol‐Assisted Chemical Vapour Deposition

Hybrid approaches coupling sol–gel and plasma for the deposition of oxide-based nanocomposite thin films: a review

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The CVD of Nanocomposites Fabricated via Ultrasonic Atomization

Cited by 13 publications

References 25 publications

TiO2–SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O2/HMDSO low-pressure plasma

TiO2–SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O2/HMDSO low-pressure plasma

Nanocomposite Coatings Codeposited with Nanoparticles Using Aerosol‐Assisted Chemical Vapour Deposition

Hybrid approaches coupling sol–gel and plasma for the deposition of oxide-based nanocomposite thin films: a review

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TiO₂–SiO₂ nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O₂/HMDSO low-pressure plasma

TiO₂–SiO₂ nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O₂/HMDSO low-pressure plasma