The cylindrical DC magnetron discharge: I. Particle-in-cell simulation

Straaten, T. A. van der; Cramer, N. F.; Falconer, I. S.; James, B. W.

doi:10.1088/0022-3727/31/2/004

Cited by 56 publications

(42 citation statements)

References 46 publications

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“…They compared the calculated profiles of the ionization rate with the measurements of the radial profile of the current [3] and the axial profile of the optical emission [4]. Van der Straaten et al [15,16] recently performed a one-dimensional particle-in-cell/Monte Carlo (PIC/MC) simulation [17,18] of a cylindrical post-cathode dc magnetron and examined the complicated discharge structure in detail. Van der Straaten et al found that the discharge exhibits a transition from the positive-space-charge (PSC) mode at higher pressure to the negative-space-charge (NSC) mode at lower pressure.…”

Section: Introductionmentioning

confidence: 99%

A self-consistent numerical analysis of a planar dc magnetron discharge by the particle-in-cell/Monte Carlo method

Kondo

Nanbu

1999

J. Phys. D: Appl. Phys.

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The structure of axisymmetrical dc planar magnetron discharge is clarified by the use of the particle-in-cell/Monte Carlo method. The magnetron has two concentric cylindrical magnets behind the cathode. Here the effects of magnetization in the magnets, M, and the emission coefficient of secondary electrons, γ , on the discharge structure are examined. Four discharge conditions are considered: (i) M = 0.50 T and γ = 0.12, (ii) M = 0.75 T and γ = 0.12, (iii) M = 1.00 T, γ = 0.12 and (iv) M = 0.50 T and γ = 0.15. The complete steady states are obtained for the four cases; no oscillations or waves are found in the plasma. The electrical field component normal to the electrode varies greatly in the axial and radial directions near the cathode. The plasma-density profile exhibits a peak near the edge of the cathode sheath. As M or γ increases, the sheath thickness decreases. Also, the spatial distributions of the space charge, ion flux onto the cathode, ion mean kinetic energy and rates of inelastic collision of electrons are examined in detail.

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Section: Introductionmentioning

confidence: 99%

A self-consistent numerical analysis of a planar dc magnetron discharge by the particle-in-cell/Monte Carlo method

Kondo

Nanbu

1999

J. Phys. D: Appl. Phys.

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“…In the preceding paper we reported one-dimensional particle-in-cell-Monte Carlo collision (PIC-MCC) simulations of a cylindrical DC magnetron discharge which indicated the existence of a negative space charge (NSC) mode of operation at low pressures [1]. Unlike the positive space charge (PSC) mode which is observed in unmagnetized glow discharges and in magnetized discharges at higher pressures, which features a thin positive space charge sheath at the cathode (the cathode fall), the NSC mode is characterized by a broad negative space charge sheath at the anode, across which most of the applied potential appears.…”

Section: Introductionmentioning

confidence: 99%

“…Ions are therefore expected to leave the discharge more readily than are electrons. As discussed in [1], the positive space charge sheath, which forms at the cathode in unmagnetized discharges as a result of the large disparity in electron and ion mobilities, is not expected to exist under such conditions. Instead, the results of one-dimensional (1D) PIC simulations predict that a negative space charge region forms at the anode.…”

Section: Introductionmentioning

confidence: 99%

The cylindrical DC magnetron discharge: II. The negative space charge mode

Straaten

Cramer

Falconer

et al. 1998

J. Phys. D: Appl. Phys.

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Particle-in-cell (PIC) simulations in one spatial dimension of a cylindrical post-cathode direct current magnetron discharge have shown that there is a continuous transition from a positive space charge (PSC) mode of operation at higher pressures to a negative space charge (NSC) mode at lower pressures. In this paper we extend this work using a PIC code to investigate the NSC mode in detail. Profiles of ionization and inelastic collision rate, averaged charged particle energies and energy distributions indicate that the size and location of the region of power dissipation depend strongly on the operating pressure. Langmuir probe measurements of the radial distribution of floating potential in a laboratory magnetron discharge do not exhibit the systematic variation with changes in magnetic field or pressure that are predicted by the simulations. This implies the existence of an anomalous transport mechanism which maintains the PSC mode at low pressures and which cannot be modelled self-consistently by a PIC code in one spatial dimension.

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“…Most of the applications that were developed using these coatings were in the field of semiconductors, hard coatings, and in wide variety of other applications [3][4][5]. In comparison to planar magnetrons, where the target is planar in shape, cylindrical magnetrons are not very much used for deposition purposes.…”

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confidence: 99%

Deposition and characterization of copper thin films on a polymer surface by using a dc cylindrical magnetron sputtering technique

Tyagi

Ranjan

Rane

et al. 2008

Phys. Status Solidi (c)

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In the present study copper thin films were deposited on a polymer surface at room temperature using a specially developed DC cylindrical magnetron sputtering technique. The polymer chosen is light weight with a smooth surface. To have strongly adherent copper films, the polymer surface was initially etched for 2 hours by using an argon glow discharge created by a bi‐polar pulse power supply. After the etching treatment the water contact angle decreased from 75° to 9°. A dc cylindrical post magnetron, made from copper, was specially developed for depositing copper on the etched surface. The magnetron was biased to ‐800 V with typical discharge currents ∼ 200 mA. An axial magnetic field of 100 Gauss was applied to have EXB rotation of electrons. Argon was the sputtering gas during deposition at a pressure of 0.015 mbar. The sputtered copper was deposited on the etched polymer for 8 hours giving a film thickness of ∼12 μm. X‐ray diffraction studies showed the formation of polycrystalline copper film with sub‐100 nm crystallite sizes. Scanning electron microscopy showed the surface morphology. The cylindrical post magnetron was developed as it gave reduced deposition rate, and lower amount of stresses made the film strongly boned to the polymer surface. The article highlights the development of the cylindrical post magnetron and its use as a reliable coating device on various surfaces. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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The cylindrical DC magnetron discharge: I. Particle-in-cell simulation

Cited by 56 publications

References 46 publications

A self-consistent numerical analysis of a planar dc magnetron discharge by the particle-in-cell/Monte Carlo method

A self-consistent numerical analysis of a planar dc magnetron discharge by the particle-in-cell/Monte Carlo method

The cylindrical DC magnetron discharge: II. The negative space charge mode

Deposition and characterization of copper thin films on a polymer surface by using a dc cylindrical magnetron sputtering technique

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