Korean. J. Mater. Res.
 2007
DOI: 10.3740/mrsk.2007.17.1.031
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The Deposition and Characterization of Antistiction Layer forNanoimprint Lithography by VSAM (Vapor Self Assembly Monolayer)

차남구 차남구1,
김규채 김규채2,
박진구 박진구3
et al.
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