The depth resolution of composition-depth profiles obtained by ball-cratering and Auger electron spectroscopy

Brown, IK; Hall, D. D.; Walls, John M.

doi:10.1016/0042-207x(81)90080-4

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

1983

2002

Publication Types

Select...

Article3

Book2

Relationship

Self Cite0

Independent5

Authors

Journals

Cited by 7 publications

References 9 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

Quantification of sputter depth profiles by means of wedge crater sputtering—a new technique for depth scale calibration

Voigtmann

Moldenhauer

1988

Surface & Interface Analysis

View full text Add to dashboard Cite

An essential part of depth profile quantification is the conversion of sputtering time into depth, for which a simple method is described. It requires an ion gun providing a sufiicient fine focusable ion beam. A suitable beam control produces a wedgelike distribution of ion current density in a raster field which is large compared to the ion beam cross-section. A 'wedge crater' is sputtered in this way in addition to the 'normal crater' for depth profiling. The wedge crater profile obtained of surface profilometer measurements provides the sputtering timtxlepth relation. Moreover the sputtering rate as a function of depth may be deduced from wedge crater profile. Application of the method to SIMS depth profiling in multilayer thin film systems shows its usefulness in depth scale calibration and intensity correction. Small expenditure and universal applicabTty are advantages in comparison with other methods.

show abstract