The development of direct laser interference patterning: past, present, and new challenges

Abstract

This manuscript introduces a comprehensive overview in the field of Direct Laser Interference Patterning (DLIP) with a focus on its evolution over the last years, its current status, and the emerging challenges it faces. Starting with the emerging stages of DLIP, attention will be directed towards the role played by the development of innovative optical systems, which have been instrumental in pushing the boundaries of precision and control. Examples of surface functionalization achieved through DLIP techniques are also showcased, emphasizing the transformative impact that DLIP has had across various industries, from the enhancement of material properties to the facilitation of new functionalities. Furthermore, consideration will be given to the evolving landscape of inline monitoring approaches within DLIP. These monitoring techniques are poised to address the intricate challenges associated with real-time quality control and process optimization in DLIP applications.