1970
DOI: 10.1016/0013-4686(70)85002-2
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The dissolution of porous oxide films on aluminium

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Cited by 106 publications
(44 citation statements)
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“…4 and 5, where Pis a solubilized aluminum species and D is a deactivated (insoluble) surface site. These steps may involve interaction of X * sites with species in solution such as H+ and SO4- (Diggle et al, 1970). The deactivation process, Eq.…”
Section: Model Developmentmentioning
confidence: 99%
“…4 and 5, where Pis a solubilized aluminum species and D is a deactivated (insoluble) surface site. These steps may involve interaction of X * sites with species in solution such as H+ and SO4- (Diggle et al, 1970). The deactivation process, Eq.…”
Section: Model Developmentmentioning
confidence: 99%
“…The key reactions responsible for the formation of anodic nanoporous Al 2 O 3 [28][29][30][31][32][33][34] and TiO 2 [36][37][38][39] apparently are similar. Initially, oxide grows at metal surface due to interaction of metal with O 2− or OH − ions [29].…”
Section: A Anodization Processmentioning
confidence: 99%
“…Fortunately, they can develop an insulating film in the ambient atmosphere as a result of their natural tendency for direct oxidation with atmospheric oxygen under normal conditions [5]. The stability of the surface oxide formed on these materials and its protective nature represent a major field of research [6][7][8][9]. It was reported that the barrier film formed on Al and Al-alloys is of a dual Nature.…”
Section: Introductionmentioning
confidence: 99%
“…It was reported that the barrier film formed on Al and Al-alloys is of a dual Nature. It consists of an adherent, compact and stable inner layer of oxide film covered with a porous, less stable outer layer which is more susceptible to corrosion [7][8][9][10][11][12]. The surface oxide film on these materials is stable, in the pH range 4-9.…”
Section: Introductionmentioning
confidence: 99%