The economic benefits of new stepper technology for manufacturing with 0.35 mu m IC design rules

Bigelow, M.G.; Hout, Frits J. van

doi:10.1109/asmc.1992.253825

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings

DOI: 10.1109/asmc.1992.253825

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The economic benefits of new stepper technology for manufacturing with 0.35 mu m IC design rules

M.G. Bigelow

Frits J. van Hout²

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Hybrid Lithography System Using E-beam Direct Writer And Optical Stepper

Kaneko¹,

Shibata²,

Sakitani³

et al.

Proceedings. IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

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E-beam direct writing technology using cell projection method has brought high throughput of approximately 20 wafers per hour (6 inches). Because that the e-beam lithography has essentially several advantages of mask-less, high resolution, and flexible and high accurate patterning on wafers, the new e-beam system would be an important candidate of the lithography tool for the mass production of semiconductor devices ruled less than 0.3 pm.On the other hand, phase shifting reticles for stepper have still economic and technical problems such as design automation, inspection, repair and long stability. Deep UV (DUV) and X ray lithography have not brought sufficient results of actual devices.A hybrid system, consists of the high throughput e-beam direct writers to manage critical layers and optical steppers to operate other layers with conventional reticles, would be the most realistic and optimized model for the economic production over more than two generations. This paper describes the economy analysis of systems with "COO (Cost of Ownership) Model" using several parameters of throughput, feature size, defect size, equipment cost, variable cost, equipment utilization capability, reticle investment, and others.

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Hybrid Lithography System Using E-beam Direct Writer And Optical Stepper

Kaneko¹,

Shibata²,

Sakitani³

et al.

Proceedings. IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

View full text Add to dashboard Cite

show abstract

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The economic benefits of new stepper technology for manufacturing with 0.35 mu m IC design rules

Cited by 1 publication

References 2 publications

Hybrid Lithography System Using E-beam Direct Writer And Optical Stepper

Hybrid Lithography System Using E-beam Direct Writer And Optical Stepper

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