2008
DOI: 10.1016/j.msea.2007.04.101
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The effect of ageing on microstructure and nanoindentation behaviour of dc magnetron sputter deposited nickel rich NiTi films

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Cited by 25 publications
(6 citation statements)
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“…The absolute values of hardness and Young's moduli, e.g. Ti 50 Ni 40 Cu 10 ∼3.7 GPa and 115 GPa, respectively, correspond well to values published for other Ti-Ni thin films determined using nanoindentation [53][54][55][56][57]. However, the Young's moduli for the martensite are considerably larger than those determined for bulk alloys, for which additionally, the Young's modulus of austenite is found to be larger than that of martensite, i.e.…”
Section: Resultssupporting
confidence: 86%
“…The absolute values of hardness and Young's moduli, e.g. Ti 50 Ni 40 Cu 10 ∼3.7 GPa and 115 GPa, respectively, correspond well to values published for other Ti-Ni thin films determined using nanoindentation [53][54][55][56][57]. However, the Young's moduli for the martensite are considerably larger than those determined for bulk alloys, for which additionally, the Young's modulus of austenite is found to be larger than that of martensite, i.e.…”
Section: Resultssupporting
confidence: 86%
“…Oliver and Pharr [19] developed a mathematical model to evaluate nano-hardness and modulus of elasticity by analysis of the indentation load-displacement curves resulting from the nanoindentation test. Most of the previous studies concerning determination of hardness and modulus of elasticity by nanoindentation techniques were evaluated either on thin films [20][21][22][23] or on bulk ceramics or ceramic composite materials [24][25][26]. Very few of the reported investigations [27][28][29] on the evaluation of these properties were carried out on coatings developed by plasma technology.…”
Section: Introductionmentioning
confidence: 99%
“…The phase transformation and shape memory characteristics of Ni-Ti thin films are strongly influenced by several metallurgical factors (alloy composition, annealing temperature, ageing temperature, and ageing time) and the sputtering conditions (gas pressure, target power, target to substrate distance, deposition temperature, substrate temperature, and bias voltage). [8] From the practical point of view, it can be stated that magnetron sputtering technique is a compatible deposition method for microelectro-mechanical-system. This technique can be used to fabricate the Ni-Ti thin films under the precise control of film composition and quality.…”
Section: Introductionmentioning
confidence: 99%