Abstract:Phone/Fax: þ00 983 615 552 935 (Co 75 Cr 13 Pt 12 ) 100Àx (Al 2 O 3 ) x (x ¼ 3, 5, 10, and 13 wt.%) thin films were deposited onto the Cr underlayer by an RF magnetron sputtering technique. The effects of annealing treatment on the structure and magnetic properties of the amorphous film with 13 wt.% Al 2 O 3 content were investigated. Increasing of aluminum oxide between 3 and 13 wt.% causes a reduction in magnetization of the films due to a decrease in the magnetic moments in the layer. On annealing the param… Show more
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