“…[1][2][3][18][19][20][21][22] However, uneven current density distributions and difficult mass transfers inside the THs, especially for a high aspect ratio (AR), commonly result in a subconformal deposition (i.e., a low throwing power and a copper overhang at the TH mouth). [8][9][10][11][12][13][14][15][16] These physical issues have been overcome by the use of chemical additives in the copper plating solution, which changes the secondary current density distribution due to the adsorption, consumption and desorption of these chemical additives inside the TH during copper electroplating. [18][19][20][21][22] Two typical chemical additives are nitrotetrazolium blue chloride monohydrate (NTBC) 19,23 and tetranitroblue tetrazolium chloride (TNBT), 20,21 and their molecular structures are illustrated in Fig.…”