ICSE'98. 1998 IEEE International Conference on Semiconductor Electronics. Proceedings (Cat. No.98EX187)
DOI: 10.1109/smelec.1998.781154
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The effect of backside films on rapid thermal oxidation (RTO) growth on silicon wafers

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“…Phosphorus segregates at the Si (SiC) side of the Si/SiO 2 (SiC/SiO 2 ) interface during oxidation of P‐doped Si and SiC, 68,69 and can therefore affect the interface reaction rate. However, implanted P does not reduce (and in concentrations greater than ∼10 19 cm −3 even increases) the oxidation rate of either Si 70–74 or SiC, 75,76 which is consistent with our observations that monazite does not affect the oxidation rate of pure SiC.…”
Section: Discussionsupporting
confidence: 92%
“…Phosphorus segregates at the Si (SiC) side of the Si/SiO 2 (SiC/SiO 2 ) interface during oxidation of P‐doped Si and SiC, 68,69 and can therefore affect the interface reaction rate. However, implanted P does not reduce (and in concentrations greater than ∼10 19 cm −3 even increases) the oxidation rate of either Si 70–74 or SiC, 75,76 which is consistent with our observations that monazite does not affect the oxidation rate of pure SiC.…”
Section: Discussionsupporting
confidence: 92%