2013
DOI: 10.1016/j.diamond.2013.10.008
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The effect of boron doping on the morphology and growth rate of micron diamond powders synthesized by HFCVD method

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Cited by 21 publications
(15 citation statements)
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“…In fact, the addition of boron as dopant leading to significant enhancement in growth-rate of crystal is also found elsewhere [22,23]. Sun et al believe that the difference of the atomic radius between boron and carbon readily gives rise to the occurrence of the crystal lattice distortion and dislocation [24]. This lattice defects could reduce the interfacial energy, and thus accelerate the reaction of active species.…”
Section: Capacitive Propertiesmentioning
confidence: 77%
“…In fact, the addition of boron as dopant leading to significant enhancement in growth-rate of crystal is also found elsewhere [22,23]. Sun et al believe that the difference of the atomic radius between boron and carbon readily gives rise to the occurrence of the crystal lattice distortion and dislocation [24]. This lattice defects could reduce the interfacial energy, and thus accelerate the reaction of active species.…”
Section: Capacitive Propertiesmentioning
confidence: 77%
“…This is attributed to two factors, the size difference of initial seeds and the existence of many spontaneous nuclei (o 1 ÎŒm) inevitably growing on the substrate during the deposition process, which is demonstrated in Refs. [5,14]. Accordingly, we shift our attention from the seeding initiation method to the self-nucleation one so as to deposit the well-shaped microcrystalline diamonds with a narrow particle size distribution.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the powders are usually of low quality with irregular shapes and many morphological imperfections such as sharp edges and protruding points. Such particles, particularly for the needle-shaped ones, being of the poor anti-impact performance, have a highly negative impact on the surface quality of finished products and polishing efficiency [1][2][3][4][5]. On the other hand, chemical vapor deposition (CVD) has attracted considerable attention due to the synthetic diamond crystals with well-defined morphology and size and smooth surfaces [6][7][8][9].…”
Section: Introductionmentioning
confidence: 99%
“…There are recent developments in the deposition of microcrystalline diamond particles by chemical vapor deposition (CVD) methods [4][5][6][7][8][9]. Seeding and selfnucleation initiation approaches are two main current research techniques in terms of initiating diamond nucleation.…”
Section: Introductionmentioning
confidence: 99%
“…However, due to particle sizes difference issue, the final crystals deposited via seeding initiation method might be not qualified for commercial powders unless postprocessed with grainsieving. Two factors may account for the above issue, the initial seed size inhomogeneity expanding with increasing regrowth duration and the inevitable arising of spontaneous nuclei (< 1 ÎŒm) developing on the substrate at the deposition, which is demonstrated in [7,8]. Fortunately, the self-nucleation initiation approach could avoid the two issues, by which the diamond particles have not only the wellshaped morphology but a narrow range of particle sizes [6].…”
Section: Introductionmentioning
confidence: 99%