The effect of deposition parameters on radiofrequency sputtered molybdenum thin films

Khatri, H.; Marsillac, Sylvain

doi:10.1088/0953-8984/20/05/055206

Cited by 52 publications

(46 citation statements)

References 15 publications

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“…The Mo thin films sputtered using ordinary d.c. [2,18] and r.f. [6] magnetron sputtering at low pressure were found to have compressive strain and showed low resistivity but our pulsed d.c. sputtered Mo films were found to have very high tensile strain with relatively high resistivity. The resistivity was reduced to a lower value suitable for solar cell applications following heat treatment.…”

Section: Accepted M Manuscriptmentioning

confidence: 64%

“…The main concern about high tensile strain or str ess in films is that it usually leads to cracking a nd subsequent peeling off fr om the substrate [6,16] . The greater the thickness the greater will be the cracking / peeling of f force for a given level of stre ss.…”

Section: Accepted M Manuscriptmentioning

confidence: 99%

“…Sputtering is considered as one of the most important of these because it offers control over the different operating parameters and the ability to produce uniform layers with high reproducibility rates compared to other techniques such as thermal evaporation. Mo films in the past have been traditionally produced by d.c sputtering [2][3][4] or r.f sputtering [6]from a solid target. Various commercial industries such as Shell Solar, Würth Solar, Global Solar, Nanosolar, Ascent Solar, etc.. use sputtered Mo films on various substrates such as glass, steel or flexible polymer as a back contact for CIGS based solar cells [7].…”

Section: Introductionmentioning

confidence: 99%

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Nano-structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications

2011

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Nano-structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications, Thin Solid Films (2011Films ( ), doi: 10.1016Films ( /j.tsf.2011 This is a PDF file of an unedited manuscript that has been accepted for publication. As a service to our customers we are providing this early version of the manuscript. The manuscript will undergo copyediting, typesetting, and review of the resulting proof before it is published in its final form. Please note that during the production process errors may be discovered which could affect the content, and all legal disclaimers that apply to the journal pertain. Cu(In,Ga)Se 2 based solar cells and as such the properties of these layers play an important role in the overall cell structure. This paper describes the production of molybdenum films using pulsed d.c magnetron sputtering from compressed molybdenum powder targets. The films were deposited at different substrate temperatures under constant power and constant current modes, and analysed using X-ray diffraction, scanning electron microscopy, atomic force microscopy and four point resistance probe. Mechanical strain and resistivity were found to decrease with substrate temperature together with a shift in the (110) crystallographic plane towards higher diffraction angles. All films were well adhered to the glass substrates irrespective of their high tensile strain. Surface morphology analysis revealed the presence of nano-structured stress relief patterns which can enhance the nucleation sites for subsequent CuInSe 2 deposition. A high-resolution cross sectional image showed the columnar growth of the films. Surface roughness analysis revealed that roughness increased with increase in substrate temperature. A C C E P T E D M A N U S C R I P T ACCEPTED MANUSCRIPT KeywordsMolybdenum films, Pulsed D.C. Magnetron Sputtering, nano-structured stress relief pattern, powder sputtering, back contact layer.

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Section: Accepted M Manuscriptmentioning

confidence: 64%

Section: Accepted M Manuscriptmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Nano-structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications

2011

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“…Under lower pressure the mean free path of the particles is longer and the films landing with higher energies tend to be more dense resulting in relatively lower resistivity values (Bourgault et al 2008). Moreover, at lower pressure there is also a chance of eliminating any presence of oxygen in the films further affecting the electrical resistivity (Khatri and Marsillac 2008).…”

Section: Resultsmentioning

confidence: 99%

Power generation from thermoelectric system-embedded Plexiglas for green building technology

Inayat

Hussain

2012

Appl Nanosci

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CitationInayat SB, Hussain MM (2013) Abstract Thermoelectric materials embedded through or inside exterior glass windows can act as a viable source of supplemental power in geographic locations where hot weather dominates. This thermoelectricity is generated because of the thermal difference between the high temperature outside and the relatively cold temperature inside. Using physical vapor deposition process, we experimentally verify this concept by embedding bismuth telluride and antimony telluride through the 5 mm Plexiglas to demonstrate 10 nW of thermopower generation with a temperature gradient of 21°C. Albeit tiny at this point with non-optimized design and development, this concept can be extended for relatively large-scale power generation as an additional power supply for green building technology.

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“…One material that suits almost all the above requirements is molybdenum (Mo), it provides a unique back-contact material for CIGS [2] and has microstructures that can be from dense to porous depending on the sputter processing parameters such as the deposition pressure, substrate bias and temperature; this variability of the microstructure results in variations in the residual stress, electrical resistivity and film adhesion [3][4][5]. Sputtering working pressure influences the properties of sputtered atoms in two main ways [6,7].…”

Section: Introductionmentioning

confidence: 99%

Substrate Temperature Effects on DC Sputtered Mo thin film

Ahn

Lee

2017

Appl. Sci. Converg. Technol.

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To improve the adhesion of Mo thin film as a back contact material, a DC magnetron sputtering system was used to deposit in the form of a bi-layer on soda-lime glass. Films with low resistivity and good adhesion were obtained from this deposition, even though the two qualities were found be hard to obtain at the same time. The best Mo bilayer showed a resistivity of 8.13 × 10Ω·cm at 500 o C and 3.0 × 10 −3 Torr. The XRD measurements showed that the crystallites of the films were mainly oriented in the (110) direction, the FE-SEM images revealed that the resistivity of the Mo films decreased with increasing substrate temperature, which temperature reduction is accompanied by an increase of the grain size. These experimental results were analyzed using the Fuchs-Sondheimer theory. Our Mo bilayer film with better crystallinity and lower resistivity can be suitably used as a back-contact layer for CIGS solar cells.

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The effect of deposition parameters on radiofrequency sputtered molybdenum thin films

Cited by 52 publications

References 15 publications

Nano-structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications

Nano-structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications

Power generation from thermoelectric system-embedded Plexiglas for green building technology

Substrate Temperature Effects on DC Sputtered Mo thin film

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