The Effect of Fabrication Error on the Performance of Mid-Infrared Metalens with Large Field-of-View

Li, Aoling; Li, Jianhua; Jia, Honghui; Duan, Huigao; Hu, Yueqiang

doi:10.3390/nano13030440

Cited by 8 publications

(3 citation statements)

References 41 publications

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“…Optical devices are sensitive to semiconductor manufacturing limitations in different manners than ICs. Some of the more well known optical device sensitivities include corner rounding and etched sidewall angles [10].…”

Section: Manufacturing Impact On Optical Device Performancementioning

confidence: 99%

Metalens manufacturing complexities and costs

Melvin,

Chalony,

Dawes

et al. 2024

Advanced Etch Technology and Process Integration for Nanopatterning XIII

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Background: Metalenses are flat devices that focus and manipulate optical waves. Unlike reflective and refractive optics, metalenses rely on phase shifts introduced by subwavelength metastructures. Aim: Demonstrate the cost and performance impact of using manufactured metaatoms from two lithography processes to design and manufacture metalenses. Approach: Design two types of metalenses, the first type (ideal) uses an ideal design made up of square metaatoms. This lens design is then simulated using both 193 nm and 248 nm lithography processes. The second type (manufactureaware) uses a design that is built around metaatom profiles produced by the corresponding lithography process (193 nm and 248 nm respectively). By comparing the performance of these two approaches (ideal and manufacture-aware) we demonstrate the process performance impact can be reduced. Results: Comparing 193 nm and 248 nm processes show a up to a 27% difference in monochromatic metalens performance for a design derived from ideal metaatoms. However, by simulating manufactured metaatoms and using them in the design stage, manufactured metalens performance returns to within 7% of ideal. Conclusions: When designing with manufactured metaatoms rather than ideal metaatoms, metalens performance is similar between both 193 nm and 248 nm processes and manufacture-aware design makes either process viable for visible-light metalens manufacturing.

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Section: Manufacturing Impact On Optical Device Performancementioning

confidence: 99%

Metalens manufacturing complexities and costs

Melvin,

Chalony,

Dawes

et al. 2024

Advanced Etch Technology and Process Integration for Nanopatterning XIII

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“…It is worth noting that this effect has been reported with other hybrids based on azobenzene and various nanoparticles (AuNPs and AgNPs), but no conclusive explanations were reported. 24,[44][45][46][47] The photoconversion from (E) to (Z) was estimated to be quantitative when CIS@n_(E)-Azo hybrids were exposed to UV light (λ ex = 365 nm) and the isomerization quantum yields of Φ (E)→(Z) ≈ 19% were measured (see Table 2). Such a decrease in Φ (E)→(Z) between CIS@n_Azo and AzoLA (−86%) can be attributed to the different environments of the azobenzene molecules when they are in solution or in proximity to the QDs.…”

Section: Photochromic Behaviourmentioning

confidence: 99%

Copper indium sulfide quantum dots enabling quantitative visible light photoisomerisation of (E)-azobenzene chromophores

Ziani,

Bellatreccia,

Battaglia

et al. 2024

Nanoscale

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“…In contrast, the absence of structural units has the least effect on the performance of the metalens. Additionally, other researchers have analyzed the impact of fabrication errors on the focusing efficiency of metalenses in the infrared band [30][31][32]. These metalenses are robust to minor variations in structural units due to the large characteristic dimensions of the structural units in this band.…”

Section: Introductionmentioning

confidence: 99%

The Effect of Height Error on Performance of Propagation Phase-Based Metalens

Qiu,

Deng,

Zhan

et al. 2024

Micromachines

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Metalenses, as a new type of planar optical device with flexible design, play an important role in miniaturized and integrated optical devices. Propagation phase-based metalenses, known for their low loss and extensive design flexibility, are widely utilized in optical imaging and optical communication. However, fabrication errors introduced by thin-film deposition and etching processes inevitably result in variations in the height of the metalens structure, leading to the fabricated devices not performing as expected. Here, we introduce a reflective TiO2 metalens based on the propagation phase. Then, the relationship between the height variation and the performance of the metalens is explored by using the maximum phase error. Our results reveal that the height error of the unit structure affects the phase rather than the amplitude. The focusing efficiency of our metalens exhibits robustness to structural variations, with only a 5% decrease in focusing efficiency when the height varies within ±8% of the range. The contents discussed in this paper provide theoretical guidance for the unit design of the propagation phase-based metalens and the determination of its allowable fabrication error range, which is of great significance for low-cost and high-efficiency manufacturing.

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The Effect of Fabrication Error on the Performance of Mid-Infrared Metalens with Large Field-of-View

Cited by 8 publications

References 41 publications

Metalens manufacturing complexities and costs

Metalens manufacturing complexities and costs

Copper indium sulfide quantum dots enabling quantitative visible light photoisomerisation of (E)-azobenzene chromophores

The Effect of Height Error on Performance of Propagation Phase-Based Metalens

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