The effect of fast secondary electrons on X‐ray microanalysis in the scanning electron microscope

Gauvin, Raynald; Hovington, Pierre; Drouin, Dominique

doi:10.1002/sca.4950210403

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1999

DOI: 10.1002/sca.4950210403

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The effect of fast secondary electrons on X‐ray microanalysis in the scanning electron microscope

Raynald Gauvin

Pierre Hovington

Dominique Drouin

Abstract: Summary:In this paper, the effect of fast secondary electrons (FSE), which result from inelastic scattering of incident electrons, on the characterization of materials in the scanning electron microscope are investigated with the aid of Monte Carlo simulations. The effect of FSE on x-ray microanalysis of light elements is investigated. A full description of the Monte Carlo simulations of FSE in solids is given.

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Cited by 3 publications

(2 citation statements)

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“…Their effect on the yield of x-ray emission and on the spatial resolution of x-ray microanalysis is presented. This work follows previous work about the effect of Fast Secondary Electrons on x-ray microanalysis in the transmission electron microscope [1] and in the scanning electron microscope [2]. The effect of Auger electrons on x-ray microanalysis was modeled using Monte Carlo simulations following the work of Gauvin et al [3].…”

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confidence: 98%

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The Effect of Auger Electrons on X-Ray Microanalysis in Electron Microscopy

Gauvin

2007

MAM

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This paper presents the effect of Auger electrons on x-ray microanalysis in electron microscopy of thin foils. Their effect on the yield of x-ray emission and on the spatial resolution of x-ray microanalysis is presented. This work follows previous work about the effect of Fast Secondary Electrons on x-ray microanalysis in the transmission electron microscope [1] and in the scanning electron microscope [2]. The effect of Auger electrons on x-ray microanalysis was modeled using Monte Carlo simulations following the work of Gauvin et al. [3]. In these simulations, the fit of elastic Mott cross sections including a relativistic correction was used [4]. For energy above 30 keV, a relativistic version of Bethe's stopping power was used. Between each collision of the primary electron, an Auger electron is generated with its appropriate current, or probability, that is used to weight the number of x-rays generated in its trajectory. The curve of x-ray generation of the Auger electron is computed using the following equation:

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confidence: 98%

“…Clearly, the Auger electrons can degrade the spatial resolution in that case if the Auger x-ray yield is significant. Figure [ 2] shows the fraction of x-ray generated by Al KLL Auger electron (E A = 1.3932 keV) in an Al -1% (At.) B alloy and by Au M4N67N67 Auger electrons in an Au -1% (At.)…”

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confidence: 99%

The Effect of Auger Electrons on X-Ray Microanalysis in Electron Microscopy

Gauvin

2007

MAM

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Monte Carlo analysis of the detection of clay occlusion of respirable quartz particles using multiple voltage scanning electron microscopy

Hnizdo

Wallace

2002

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Summary:The electron incident-energy dependence of the relative intensities of Al and Si x-rays produced in a respirable-sized quartz particle by scanning electron microscopy is sensitive to the inhomogeneity of the distribution of Al and Si in the particle. Realistic Monte Carlo calculations of this energy dependence validate the proposal to use this effect for the detection of particles in which an aluminosilicate coating occludes the surface of a silica core.

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What Remains to Be Done to Allow Quantitative X-Ray Microanalysis Performed with EDS to Become a True Characterization Technique?

Gauvin

2012

Microsc Microanal

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This article reviews different methods used to perform quantitative X-ray microanalysis in the electron microscope and also demonstrates the urgency of measuring the fundamental parameters of X-ray generation for the development of accurate standardless quantitative methods. Using ratios of characteristic lines acquired on the same X-ray spectrum, it is shown that the Cliff and Lorimer K A-B factor can be used in a general correction method that is appropriate for all types of specimens and electron microscopes, providing that appropriate corrections are made for X-ray absorption, fluorescence, and indirect generation. Since the fundamental parameters appear in the K A-B factor, only the ratio of the ionization cross sections needs to be known, not their absolute values. In this regard, the measurement of ratios of the K A-B factor (or intensities at different beam energies of the same material with no change of beam spreading in the material) permits the validation for the best models to compute the ratio of ionization cross sections. It is shown, using this method, that the nonrelativistic Bethe equation, to compute ionization cross section, is very close to the equation of E. Casnati et al. (J Phys B 15, 155-167, 1982) and also to the equations proposed by D. Bote and F. Salvat (Phys Rev A 77, 042701, 2008) for the computation of the ratio of ionization cross sections. The method is extended to show that it could be used to determine the values of the Coster-Kronig transitions factors, an important fundamental parameter for the generation of L and M lines that is mostly known with poor accuracy. The detector efficiency can be measured with specimens where their intensities were measured with an energy dispersive spectrometer detector, the efficiency of which has been measured in an X-ray synchrotron (M. Alvisi et al., Microsc Microanal 12, 406-415, 2006). The spatial resolution should always be computed when performing quantitative X-ray microanalysis and the equations of R. Gauvin (Microsc Microanal 13(5), 354-357, 2007) for bulk materials and the one presented in this article for thin films should be used. The effects of X-rays generated by fast secondary electrons and by Auger electrons are reviewed, and their effect can be detrimental for the spatial resolution of materials involving low-energy X-ray lines, in certain specific conditions. Finally, quantitative X-ray microanalysis of heterogeneous materials is briefly reviewed.

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The effect of fast secondary electrons on X‐ray microanalysis in the scanning electron microscope

Cited by 3 publications

References 12 publications

The Effect of Auger Electrons on X-Ray Microanalysis in Electron Microscopy

The Effect of Auger Electrons on X-Ray Microanalysis in Electron Microscopy

Monte Carlo analysis of the detection of clay occlusion of respirable quartz particles using multiple voltage scanning electron microscopy

What Remains to Be Done to Allow Quantitative X-Ray Microanalysis Performed with EDS to Become a True Characterization Technique?

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