There is a topical technological problem of con trolling the local properties of semiconductor films, on which it is necessary to create submicron regions with preset physicochemical properties of the surface layer. This task is important, in particular, for the creation of biochips with various functional groups grafted in cer tain regions of the sensitive surface [1, 2]. One possible way to solve this problem is via the controlled creation of an appropriate topological and potential relief on a semiconductor surface by means of local laser anneal ing. The mechanisms and consequences of high intensity laser beam action on semiconductors have been studied for a long time [3], and it has been estab lished that the results of this treatment can strongly vary, depending on the character of semiconductors and parameters of laser irradiation.The present Letter reports on the possibility of cre ating local surface regions with preset properties on a micron precise scale by means of rapid phase transi tions induced via laser beam in photosensitive semi conductor films of CdS x Se 1 -x solid solutions with thicknesses up to about 1 μm.The sample films were prepared by thermal deposi tion in vacuum using a charge containing 45 wt % CdS, 55 wt % CdSe, and a doping additive of 0.1 wt % CuCl 2 . The substrates were made of polished glass with a surface roughness not exceeding 12 nm. As is known, CdS and CdSe components form a continuous series of solid solutions, which makes it possible to obtain fine grained films with homogeneous grain size distri bution and uniform composition. In addition, the presence of CdSe decreases the melting and sublima tion temperatures of the mixture as compared to those of pure CdS.The experiments were performed in an Ntegra Spectra scanning probe microscope (NT MDT, Zelenograd). The surface relief was studied by atomic force microscopy (AFM) in a tapping mode using an NSG01 (NT MDT) silicon cantilever. The samples were processed using a solid state laser operating at 473 nm with a maximum power of 35 mW in the objec tive focus plane. At a laser beam spot diameter of 0.7 μm in the focus of a 100x/0.90 M plan FLN objec tive of an Olympus LX 71 microscope, the maximum radiation power density in the incident beam was about 140 mW/μm 2 in a continuous irradiation regime. The radiation power in the course of investiga tions could be varied in a range of 35 μW-345 mW (accurate to within 10%) using a controlled neutral optical filter. Simultaneously with the laser annealing process, it was possible to measure the photolumines cence (PL) spectra of samples, which allowed changes in their properties to be monitored in situ. The PL spectra were measured by a Solar TII spectrometer incorporated in the Ntegra Spectra instrument. For the given laser, the PL spectra were recorded in a 480-1050 nm wavelength range. Figure 1 shows variations of the PL spectrum of a sample film in the course of laser annealing. The spec tra were measured in the following sequence. First, the PL spectrum was measured at a minimu...