The effect of oxygen in diamond deposition by microwave plasma enhanced chemical vapor deposition

Liou, Y.; Inspektor, A.; Weimer, R. A.; Knight, Diane S.; Messier, R.

doi:10.1557/jmr.1990.2305

Cited by 142 publications

(34 citation statements)

References 13 publications

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“…Several studies have reported enhanced growth rates or quality due to oxygen addition and, more importantly, the substrate temperature can be significantly lowered when oxygen is introduced into the hydrocarbon/H 2 gas mixtures [73][74][75][76][77][78].…”

Section: Effect Of Oxygen Additionmentioning

confidence: 99%

Diamond growth by chemical vapour deposition

Grácio¹,

Fan²,

Madaleno³

2010

J. Phys. D: Appl. Phys.

256

156

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This paper reviews the growth of diamond by chemical vapour deposition (CVD). It includes the following seven parts: (1) Properties of diamond: this part briefly introduces the unique properties of diamond and their origin and lists some of the most common diamond applications. (2) Growth of diamond by CVD: this part reviews the history and the methods of growing CVD diamond. (3) Mechanisms of CVD diamond growth: this part discusses the current understanding on the growth of metastable diamond from the vapour phase. (4) Characterization of CVD diamond: we discuss the two most common techniques, Raman and XRD, which have been intensively employed for characterizing CVD diamond. (5) CVD diamond growth characteristics: this part demonstrates the characteristics of diamond nucleation and growth on various types of substrate materials. (6) Nanocrystalline diamond: in this section, we present an introduction to the growth mechanisms of nanocrystalline diamond and discuss their Raman features. This paper provides necessary information for those who are starting to work in the field of CVD diamond, as well as for those who need a relatively complete picture of the growth of CVD diamond.

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Section: Effect Of Oxygen Additionmentioning

confidence: 99%

Diamond growth by chemical vapour deposition

Grácio¹,

Fan²,

Madaleno³

2010

J. Phys. D: Appl. Phys.

256

156

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“…We have also produced with the same design of the stage a high-quality 0.6-mm-thick pure-CVD single crystal by adding a small amount of oxygen and lowering the growth temperature to 800-1,000°C at 0.2-2% O 2 ͞CH 4 , 1-7% CH 4 ͞H 2 , and 160 torr. The added oxygen allows a lower growth temperature, which removes the nitrogen-related impurities and reduces the silicon and hydrogen impurity levels (26,27). Although this gives a lower growth rate of Ϸ10 m͞h, the rate is still over 1 order of magnitude higher than that of standard processes, typically 0.3 m͞h (26,27).…”

mentioning

confidence: 99%

“…The added oxygen allows a lower growth temperature, which removes the nitrogen-related impurities and reduces the silicon and hydrogen impurity levels (26,27). Although this gives a lower growth rate of Ϸ10 m͞h, the rate is still over 1 order of magnitude higher than that of standard processes, typically 0.3 m͞h (26,27). This high-quality diamond may be very useful in high-power laser window applications.…”

mentioning

confidence: 99%

Very high growth rate chemical vapor deposition of single-crystal diamond

Yan

Vohra

Mao

et al. 2002

Proc. Natl. Acad. Sci. U.S.A.

235

109

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Diamond possesses extraordinary material properties, a result that has given rise to a broad range of scientific and technological applications. This study reports the successful production of highquality single-crystal diamond with microwave plasma chemical vapor deposition (MPCVD) techniques. The diamond single crystals have smooth, transparent surfaces and other characteristics identical to that of high-pressure, high-temperature synthetic diamond. In addition, the crystals can be produced at growth rates from 50 to 150 m͞h, which is up to 2 orders of magnitude higher than standard processes for making polycrystalline MPCVD diamond. This high-quality single-crystal MPCVD diamond may find numerous applications in electronic devices as high-strength windows and in a new generation of high-pressure instruments requiring large single-crystal anvils. Diamond produced by low-pressure microwave plasma (MP) chemical vapor deposition (CVD) is the most promising technology for producing low-cost and high-quality large diamond (1, 2). Nevertheless, the widespread use of MPCVD diamond in many applications has not been successful due to the existence of grain boundaries of polycrystalline diamond that are produced and slow growth rates, typically 1 m͞h (1-7). Diamond's strong covalent bonds and rigid structure (8) give rise to its unique properties. Diamond is the hardest and stiffest material known, has the highest room-temperature thermal conductivity and one of the lowest thermal expansion of known materials, and is radiation-hard and chemically inert to most acidic and basic reagents. Due to the high cost, limited size, and uneasily controlled impurities of natural and synthetic highpressure, high-temperature (HPHT) diamond, the applications of diamond have in fact been limited in comparison to its great potential (8). Thus, CVD diamond is the most promising avenue available for synthetic diamond. The major CVD diamondcoating techniques are the hot-filament, radio-frequency plasma, MP, and arcjet-torch methods (8, 9). Comparing these techniques, MPCVD-reactor methods provide stable conditions, reproducible sample quality, and reasonable cost (8, 9). In fact, steady progress in MPCVD synthesis techniques has made it possible to manufacture high-quality polycrystalline CVDdiamond optical components (4, 10), but this polycrystalline material consists of a patchwork of tiny crystals welded to one another along misaligned grain boundaries, which block the flow of current (10-12). The major disadvantage of MPCVD using 12.2 cm͞2.54 GHz for plasma generation is the lower growth rate, typically 1 m͞h (1-7) compared with arcjet torches; moreover at several hundred micrometers per hour (13), the plasma tends to concentrate at tips and edges (9, 13). Here we show that MPCVD diamond can be produced as high-quality and high growth rate (50-150 m depending on stage design and methane concentration) single crystals for a variety of purposes including the enlargement of anvils (14) for compressing large samples at ultrahigh pressures....

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“…One explanation for such a coloration is the association with nitrogen-vacancyhydrogen (NVH -) complex centers [27]. On the other hand, addition of oxygen to the CVD diamond-growth chemistry can also facilitate the diamond formation [28]. New species formed in the plasma (i.e., O -and OH -) etch away impurities (hydrogen, and sp 2 carbon) and defects on growth surface more efficiently than atomic hydrogen, and therefore improve the diamond quality.…”

Section: Optical Characterization Of Cvd Single-crystal Diamondmentioning

confidence: 99%