The effect of pre-oxidation treatment on the corrosion behavior of amorphous Al 1−x Zr x solid-solution alloys

Effect of structural order on oxidation kinetics and oxide phase evolution of Al–Zr alloys

“…Moreover, the absence of grain boundaries and other lattice defects in amorphous oxides decreased the number of fast short-circuit diffusion paths, thereby promoting the formation of chemically and structurally homogeneous oxide layers of highly uniform thicknesses. Consequently, amorphous oxide layers often exhibit favourable properties unlike their crystalline counterparts, such as improved corrosion resistance [21] and high optical transparency [22]. For instance, oxidation-resistant amorphous coatings have been used to protect the metallic alloys in various corrosive environments [4,21]; amorphous oxides such as SiO2 and Al2O3 are widely used as tunnelling barriers in microelectronics [23] and amorphous oxide semiconductors (e.g.…”

“…Consequently, amorphous oxide layers often exhibit favourable properties unlike their crystalline counterparts, such as improved corrosion resistance [21] and high optical transparency [22]. For instance, oxidation-resistant amorphous coatings have been used to protect the metallic alloys in various corrosive environments [4,21]; amorphous oxides such as SiO2 and Al2O3 are widely used as tunnelling barriers in microelectronics [23] and amorphous oxide semiconductors (e.g. In-Ga-Zn-O) are used in modern thin-film transistors [5].…”

Effect of hydrogen on the chemical state, stoichiometry and density of amorphous Al2O3 films grown by thermal atomic layer deposition

“…[1][2][3][4][5][6][7][8][9] The absence of grain boundaries and lattice defects in amorphous oxides not only blocks vacancy-enhanced and short-circuit diffusion 1,8 but also improves the electronic properties (e.g., increased dielectric strength and lower leakage current) 2,4,7,8 and the corrosion resistance. 5,6 Due to their large amount of free volume and high bond flexibility, 1,3,9 amorphous oxide thin films are also more ductile than their (poly)crystalline counterparts, allowing their application on large and flexible substrates without brittle fracture. 9,10 For example, thin amorphous Al 2 O 3 (am-Al 2 O 3 ) oxide films are widely applied as a diffusion barrier for, for example, flexible microelectronic and photovoltaic devices.…”

“…Amorphous oxide films are structurally and compositionally more homogenous than their crystalline counterparts due to the lack of grain boundaries, lattice defects and secondary phases, which enables the realization of more uniform oxide film thicknesses and device properties over much larger areas. [1][2][3][4][5][6][7][8][9] The absence of grain boundaries and lattice defects in amorphous oxides not only blocks vacancy-enhanced and short-circuit diffusion 1,8 but also improves the electronic properties (e.g., increased dielectric strength and lower leakage current) 2,4,7,8 and the corrosion resistance. 5,6 Due to their large amount of free volume and high bond flexibility, 1,3,9 amorphous oxide thin films are also more ductile than their (poly)crystalline counterparts, allowing their application on large and flexible substrates without brittle fracture.…”

On the competition between synchronous oxidation and preferential oxidation in Cu-Zr-Al metallic glasses

“…Several studies on the oxidation of amorphous Zr-Al [22][23][24][25][26][27], Cu-Zr [28][29][30][31][32][33] and even Cu-Al [34][35][36] binary alloys have been reported in the literature. Cu-Zr binary alloys have the greatest glass-forming ability [37] among these three alloy systems.…”