1998
DOI: 10.1088/0022-3727/31/20/028
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The effect of pressure on a plasma plume: temperature and electron density measurements

Abstract: Measurements of temperature and electron number density measurements have been carried out on a plasma plume under various pressure conditions (p = 1-0.3 bar) using emission spectroscopy. The anode nozzle used does not generate a shock wave or an expansion-compression zone. Ar- (1%) is used as the plasma gas. Temperature values are obtained from various lines of neutral argon. Electron number densities are obtained from the Stark-effect broadening of the 486.1 nm H line and the continuum measurements. Measurem… Show more

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Cited by 34 publications
(25 citation statements)
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“…7 A temperature value of about 11 000 K was measured at 2 mm from the nozzle exit of a 10 kW Ar (25 Nl min À1 ) sprayingtype torch with a 8 mm anode diameter. The effect of pressure on the temperature and electron density in the plasma jet of a 5 kW Ar/H 2 (15 Nl min À1 1% H 2 ) torch with a 3 mm anode diameter was experimentally investigated by Singh et al 8 using spectroscopic techniques. For a pressure of one atmosphere, an axial plasma temperature of about 11 500 K and an electron density of about 6 Â 10 22 m À3 were found at 4 mm downstream from the nozzle exit.…”
Section: Introductionmentioning
confidence: 99%
“…7 A temperature value of about 11 000 K was measured at 2 mm from the nozzle exit of a 10 kW Ar (25 Nl min À1 ) sprayingtype torch with a 8 mm anode diameter. The effect of pressure on the temperature and electron density in the plasma jet of a 5 kW Ar/H 2 (15 Nl min À1 1% H 2 ) torch with a 3 mm anode diameter was experimentally investigated by Singh et al 8 using spectroscopic techniques. For a pressure of one atmosphere, an axial plasma temperature of about 11 500 K and an electron density of about 6 Â 10 22 m À3 were found at 4 mm downstream from the nozzle exit.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8][9][10][11] The particular application addressed here employs an Ar/ H 2 plasma, in the form of a dc arc jet, for methane activation and subsequent chemical vapor deposition ͑CVD͒ of polycrystalline diamond. [12][13][14][15][16][17][18][19][20] For completeness, we note that microwave-activated hydrocarbon/H 2 / Ar gas mixtures find even more widespread use for growing both CVD of single crystal, 21 microcrystalline, 22 and ͑at very low H 2 partial pressures͒ ultrananocrystalline diamond films.…”
Section: Introductionmentioning
confidence: 99%
“…[12][13][14][15][16][17][18][19][20] For completeness, we note that microwave-activated hydrocarbon/H 2 / Ar gas mixtures find even more widespread use for growing both CVD of single crystal, 21 microcrystalline, 22 and ͑at very low H 2 partial pressures͒ ultrananocrystalline diamond films. 23 In this and a subsequent article 24 we present a detailed and comprehensive analysis of the gas-phase chemistry underpinning the growth of polycrystalline diamond in a dc arc jet reactor operating with a CH 4 /H 2 / Ar mixture, involving a͒ Permanent address: Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.…”
Section: Introductionmentioning
confidence: 99%
“…All the measurements were carried out with a current of 35 A, a voltage of 35 V, a gas flow of 1.5 slm (Ar : 98%, N 2 : 2%) and a background pressure of 620 Pa. The choice of this mixture gas is due to the fact that plasmas containing molecular species are of interest in numerous applications [23] . Fig.…”
Section: Observation and Emission Intensity Of The Plasma Jetmentioning
confidence: 99%